SCHEMBL17878792

SCHEMBL17878792

C=C(C)C(=O)OC1(C)CC(C)(C)OC(=O)C1(F)F

nearest known ligand 0.32

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
MAPT P10636 1/20 0.32
XBP1 P17861 1/20 0.32
HTT P42858 1/20 0.32
KMT2A Q03164 1/20 0.32
PAX8 Q06710 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17878801 0.86 ALDH1A1 (0.32)
SCHEMBL17878789 0.85 MAPT (0.37) MAPTXBP1HTTKMT2APAX8
SCHEMBL17878800 0.81 THRB (0.37)
SCHEMBL17878790 0.79 MAPT (0.31) MAPTXBP1HTTKMT2APAX8
SCHEMBL17878804 0.78
SCHEMBL1217860 0.78 ALDH1A1 (0.32) MAPTXBP1HTTKMT2APAX8
SCHEMBL17878788 0.77 LMNA (0.30) MAPTXBP1HTTKMT2APAX8
SCHEMBL12225564 0.75 MAPT (0.39) MAPTXBP1HTTKMT2APAX8
SCHEMBL18782784 0.75
SCHEMBL1143134 0.69 ALDH1A1 (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10331031-B2 Resin composition, resist pattern-forming method and polymer JSR CORPORATION (JP) 2019-06-25 US disclosed
US-20170115570-A1 RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD AND POLYMER JSR CORPORATION (JP) 2017-04-27 US disclosed
US-20170115570-A1 RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD AND POLYMER JSR CORPORATION (JP) 2017-04-27 US disclosed
US-20160185999-A1 RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD AND POLYMER JSR CORPORATION (JP) 2016-06-30 US disclosed
US-20160185999-A1 RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD AND POLYMER JSR CORPORATION (JP) 2016-06-30 US disclosed