Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SCN9A | Q15858 | 4/20 | 0.37 |
| ▸ | CKS1B | P61024 | 1/20 | 0.31 |
| ▸ | SKP2 | Q13309 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
| ▸ | HPGD | P15428 | 1/20 | 0.30 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | GAA | P10253 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17879781 | 0.91 | CKS1B (0.37) | SCN9ACKS1BSKP2HPGDALDH1A1 | |
| SCHEMBL18823094 | 0.90 | SCN9A (0.36) | SCN9AMAPTHPGD | |
| SCHEMBL17879728 | 0.89 | SCN9A (0.37) | SCN9A | |
| SCHEMBL18823098 | 0.88 | NPSR1 (0.33) | CKS1BSKP2HPGDALDH1A1GAA | |
| SCHEMBL17883749 | 0.88 | NPSR1 (0.33) | CKS1BSKP2HPGDALDH1A1GAA | |
| SCHEMBL18788535 | 0.87 | SCN9A (0.45) | SCN9ACKS1BSKP2MAPTHPGD | |
| SCHEMBL18810694 | 0.87 | SCN9A (0.45) | SCN9ACKS1BSKP2MAPTHPGD | |
| SCHEMBL18810702 | 0.86 | SCN9A (0.41) | SCN9ACKS1BSKP2MAPTHPGD | |
| SCHEMBL17879743 | 0.85 | NPSR1 (0.33) | HPGDALDH1A1 | |
| SCHEMBL17870557 | 0.80 | LCK (0.41) | GAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11003074-B2 | Pattern formation methods and photoresist pattern overcoat compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2021-05-11 | — | — | US | disclosed |
| US-20200379351-A1 | PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2020-12-03 | — | — | US | disclosed |
| US-10684549-B2 | Pattern-formation methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2020-06-16 | — | — | US | disclosed |
| US-10481495-B2 | Topcoat compositions containing fluorinated thermal acid generators | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2019-11-19 | — | — | US | disclosed |
| US-20190243246-A1 | TOPCOAT COMPOSITIONS CONTAINING FLUORINATED THERMAL ACID GENERATORS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2019-08-08 | — | — | US | disclosed |
| US-10241407-B2 | Thermal acid generators and photoresist pattern trimming compositions and methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2019-03-26 | — | — | US | disclosed |
| US-10241411-B2 | Topcoat compositions containing fluorinated thermal acid generators | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2019-03-26 | — | — | US | disclosed |
| US-20180188654-A1 | PATTERN-FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2018-07-05 | — | — | US | disclosed |
| US-20180188654-A1 | PATTERN-FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2018-07-05 | — | — | US | disclosed |
| US-10007179-B2 | Thermal acid generators and photoresist pattern trimming compositions and methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2018-06-26 | — | — | US | disclosed |
| US-20170255103-A1 | PATTERN TRIMMING METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2017-09-07 | — | — | US | disclosed |
| US-20170255102-A1 | PATTERN TRIMMING COMPOSITIONS AND METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2017-09-07 | — | — | US | disclosed |
| US-9696629-B2 | Photoresist pattern trimming compositions and methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2017-07-04 | — | — | US | disclosed |
| US-9696629-B2 | Photoresist pattern trimming compositions and methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2017-07-04 | — | — | US | disclosed |
| US-20170123314-A1 | THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2017-05-04 | — | — | US | disclosed |
| US-20170123314-A1 | THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2017-05-04 | — | — | US | disclosed |
| US-20170123313-A1 | THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS | ROHM & HAAS ELECT MAT (US) | 2017-05-04 | — | — | US | disclosed |
| US-20170123313-A1 | THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS | ROHM & HAAS ELECT MAT (US) | 2017-05-04 | — | — | US | disclosed |
| US-20160187783-A1 | PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2016-06-30 | — | — | US | disclosed |
| US-20160187783-A1 | PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2016-06-30 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20170123313-A1 | THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS | ADH1A, ADH1C, FPR1 | SCN9A 2052/4885CKS1B 1536/4885SKP2 4707/4885 |
| US-10007179-B2 | Thermal acid generators and photoresist pattern trimming compositions and methods | ADH1A, PUF60, PARG | SCN9A 881/4885CKS1B 3339/4885SKP2 4175/4885 |
| US-20170123314-A1 | THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS | ADH1A, PUF60, PARG | SCN9A 881/4885CKS1B 3339/4885SKP2 4175/4885 |
| US-10241407-B2 | Thermal acid generators and photoresist pattern trimming compositions and methods | ADH1A, ADH1C, FPR1 | SCN9A 2052/4885CKS1B 1536/4885SKP2 4707/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.