SCHEMBL17879773

SCHEMBL17879773

COCCOCCOC(=O)c1cc(C(=O)OC(C)CC(O)(C(F)(F)F)C(F)(F)F)cc(S(=O)(=O)O)c1

nearest known ligand 0.35

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
ABCB11 O95342 1/20 0.35
CYP3A4 P08684 1/20 0.35
ADRA2B P18089 1/20 0.35
OPRD1 P41143 1/20 0.35
SCN5A Q14524 1/20 0.35
SERPINE1 P05121 1/20 0.34
CA1 P00915 3/20 0.33
CA2 P00918 3/20 0.33
KDM4E B2RXH2 1/20 0.32
ALDH1A1 P00352 1/20 0.32
GAA P10253 1/20 0.32
PKM P14618 1/20 0.32
KMT2A Q03164 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17883746 0.87 LCK (0.38) CA1CA2KMT2A
SCHEMBL17879736 0.82 LCK (0.34)
SCHEMBL20117912 0.81
SCHEMBL13343456 0.78 LCK (0.47) ABCB11CYP3A4ADRA2BOPRD1SCN5A
SCHEMBL17870557 0.74 LCK (0.41) SERPINE1GAAPKM
SCHEMBL19886175 0.74 SERPINE1 (0.49) ABCB11CYP3A4ADRA2BOPRD1SCN5A
SCHEMBL17883748 0.74 KDM4E (0.32) KDM4EALDH1A1
SCHEMBL19325615 0.73
SCHEMBL19886171 0.73 LCK (0.42) ABCB11CYP3A4ADRA2BOPRD1SCN5A
SCHEMBL19320630 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11796916-B2 Pattern formation methods and photoresist pattern overcoat compositions ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2023-10-24 US disclosed
US-11796916-B2 Pattern formation methods and photoresist pattern overcoat compositions ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2023-10-24 US disclosed
US-20210232047-A1 PATTERN FORMATION METHODS AND PHOTORESIST PATTERN OVERCOAT COMPOSITIONS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2021-07-29 US disclosed
US-11003074-B2 Pattern formation methods and photoresist pattern overcoat compositions ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2021-05-11 US disclosed
US-20200379351-A1 PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2020-12-03 US disclosed
US-10684549-B2 Pattern-formation methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2020-06-16 US disclosed
US-10481495-B2 Topcoat compositions containing fluorinated thermal acid generators ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2019-11-19 US disclosed
US-20190243246-A1 TOPCOAT COMPOSITIONS CONTAINING FLUORINATED THERMAL ACID GENERATORS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2019-08-08 US disclosed
US-10241411-B2 Topcoat compositions containing fluorinated thermal acid generators ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2019-03-26 US disclosed
US-10241407-B2 Thermal acid generators and photoresist pattern trimming compositions and methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2019-03-26 US disclosed
US-20170255103-A1 PATTERN TRIMMING METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2017-09-07 US disclosed
US-20170255103-A1 PATTERN TRIMMING METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2017-09-07 US disclosed
US-9696629-B2 Photoresist pattern trimming compositions and methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2017-07-04 US disclosed
US-9696629-B2 Photoresist pattern trimming compositions and methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2017-07-04 US disclosed
US-20170123313-A1 THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS ROHM & HAAS ELECT MAT (US) 2017-05-04 US disclosed
US-20170123314-A1 THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2017-05-04 US disclosed
US-20170123313-A1 THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS ROHM & HAAS ELECT MAT (US) 2017-05-04 US disclosed
US-20170123314-A1 THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2017-05-04 US disclosed
US-20160187783-A1 PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2016-06-30 US disclosed
US-20160187783-A1 PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2016-06-30 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20170123313-A1 THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS ADH1A, ADH1C, FPR1 ABCB11 3868/4885CYP3A4 983/4885ADRA2B 706/4885
US-20170123314-A1 THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS ADH1A, PUF60, PARG ABCB11 4099/4885CYP3A4 2147/4885ADRA2B 4119/4885
US-10241407-B2 Thermal acid generators and photoresist pattern trimming compositions and methods ADH1A, ADH1C, FPR1 ABCB11 3868/4885CYP3A4 983/4885ADRA2B 706/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.