Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HPGD | P15428 | 4/20 | 0.42 |
| ▸ | LMNA | P02545 | 4/20 | 0.42 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.42 |
| ▸ | ELANE | P08246 | 5/20 | 0.41 |
| ▸ | PARP10 | Q53GL7 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.37 |
| ▸ | SRD5A2 | P31213 | 1/20 | 0.36 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.36 |
| ▸ | GAA | P10253 | 1/20 | 0.36 |
| ▸ | PTGIR | P43119 | 1/20 | 0.35 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.34 |
| ▸ | RAB9A | P51151 | 1/20 | 0.34 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.34 |
| ▸ | THRB | P10828 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1792904 | 0.95 | HPGD (0.44) | HPGDLMNAL3MBTL1ELANEPARP10 | |
| SCHEMBL1788546 | 0.95 | ELANE (0.47) | HPGDLMNAL3MBTL1ELANEKMT2A | |
| SCHEMBL1789123 | 0.94 | KMT2A (0.40) | HPGDLMNAL3MBTL1ELANEPARP10 | |
| SCHEMBL1791275 | 0.83 | ELANE (0.46) | HPGDLMNAL3MBTL1ELANEALDH1A1 | |
| SCHEMBL10591230 | 0.81 | ELANE (0.57) | HPGDLMNAELANEPARP10KMT2A | |
| SCHEMBL890769 | 0.79 | LMNA (0.42) | HPGDLMNAL3MBTL1PARP10KMT2A | |
| SCHEMBL13401274 | 0.77 | CES2 (0.53) | HPGDLMNAL3MBTL1ELANEKMT2A | |
| SCHEMBL1792638 | 0.76 | ALDH1A1 (0.47) | HPGDLMNAL3MBTL1ELANEKMT2A | |
| SCHEMBL1789029 | 0.76 | PTGIR (0.47) | HPGDLMNAL3MBTL1KMT2AALDH1A1 | |
| SCHEMBL13134777 | 0.76 | ALDH1A1 (0.51) | HPGDLMNAL3MBTL1ELANEKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8617795-B2 | Photosensitive resin composition and pattern forming method using the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-12-31 | — | — | US | disclosed |
| EP-2512779-A1 | SUBSTRATE-BASED ADDITIVE FABRICATION PROCESS | DSM IP Assets B.V. (NL) | 2012-10-24 | — | — | EP | disclosed |
| WO-2011084578-A1 | SUBSTRATE-BASED ADDITIVE FABRICATION PROCESS | DSM IP ASSETS, B.V. (NL) | 2011-07-14 | — | — | WO | disclosed |
| US-20110123928-A1 | Photosensitive Resin Composition and Pattern Forming Method Using the Same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-05-26 | — | — | US | disclosed |