SCHEMBL1789029

SCHEMBL1789029

COc1ccc(C(=O)c2ccc(Sc3ccc([S+](c4ccc(F)cc4)c4ccc(F)cc4)cc3)cc2)cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTGIR P43119 1/20 0.47
LMNA P02545 4/20 0.46
MEN1 O00255 3/20 0.46
KMT2A Q03164 3/20 0.46
RAB9A P51151 3/20 0.46
HPGD P15428 3/20 0.46
MAPT P10636 3/20 0.46
RXFP1 Q9HBX9 2/20 0.46
MAPK1 P28482 1/20 0.46
NPSR1 Q6W5P4 1/20 0.46
ALDH1A1 P00352 5/20 0.46
GAA P10253 4/20 0.43
KDM4E B2RXH2 2/20 0.43
NPC1 O15118 3/20 0.42
TUBB4A P04350 1/20 0.42
TUBB P07437 1/20 0.42
TUBA3C P0DPH7 1/20 0.42
TUBA1B P68363 1/20 0.42
TUBA4A P68366 1/20 0.42
TUBB4B P68371 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1787786 0.88 LTA4H (0.47) LMNAMEN1KMT2ARAB9AHPGD
SCHEMBL13401274 0.87 CES2 (0.53) PTGIRLMNAMEN1KMT2ARAB9A
SCHEMBL13134777 0.86 ALDH1A1 (0.51) PTGIRLMNAMEN1KMT2ARAB9A
SCHEMBL1789123 0.84 KMT2A (0.40) LMNAMEN1KMT2AHPGDMAPT
SCHEMBL1792992 0.84 ALDH1A1 (0.48) LMNAMEN1KMT2AHPGDMAPT
SCHEMBL29869334 0.82 RXFP1 (0.51) PTGIRLMNAMEN1KMT2ARAB9A
SCHEMBL1127927 0.82 ALDH1A1 (0.49) LMNAMEN1KMT2ARAB9AHPGD
SCHEMBL1789124 0.82 GAA (0.52) LMNAMEN1KMT2AHPGDMAPT
SCHEMBL21605339 0.82 LMNA (0.66) LMNAMEN1KMT2ARAB9AHPGD
SCHEMBL1813422 0.82 LMNA (0.66) LMNAMEN1KMT2ARAB9AHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8617795-B2 Photosensitive resin composition and pattern forming method using the same TOKYO OHKA KOGYO CO., LTD. (JP) 2013-12-31 US disclosed
US-20110123928-A1 Photosensitive Resin Composition and Pattern Forming Method Using the Same TOKYO OHKA KOGYO CO., LTD. (JP) 2011-05-26 US disclosed