Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.53 |
| ▸ | GAA | P10253 | 3/20 | 0.53 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.53 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.53 |
| ▸ | USP2 | O75604 | 1/20 | 0.53 |
| ▸ | PKM | P14618 | 1/20 | 0.53 |
| ▸ | HPGD | P15428 | 1/20 | 0.53 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.49 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.49 |
| ▸ | MEN1 | O00255 | 1/20 | 0.49 |
| ▸ | MAPT | P10636 | 1/20 | 0.49 |
| ▸ | THRB | P10828 | 1/20 | 0.49 |
| ▸ | RECQL | P46063 | 1/20 | 0.49 |
| ▸ | BLM | P54132 | 1/20 | 0.49 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.49 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.49 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.49 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.46 |
| ▸ | HTT | P42858 | 1/20 | 0.46 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18319295 | 0.88 | MMP2 (0.44) | ALDH1A1GAAALOX15HSD17B10USP2 | |
| SCHEMBL28233703 | 0.85 | NR4A1 (0.59) | ALDH1A1GAAALOX15HSD17B10USP2 | |
| SCHEMBL272899 | 0.81 | ALDH1A1 (0.70) | ALDH1A1GAAALOX15HSD17B10USP2 | |
| SCHEMBL720128 | 0.81 | ALDH1A1 (0.63) | ALDH1A1GAAALOX15HSD17B10USP2 | |
| SCHEMBL29464083 | 0.81 | ALDH1A1 (0.63) | ALDH1A1GAAALOX15HSD17B10USP2 | |
| SCHEMBL17267881 | 0.81 | ALDH1A1 (0.63) | ALDH1A1GAAALOX15HSD17B10USP2 | |
| SCHEMBL29462465 | 0.79 | ALDH1A1 (0.65) | ALDH1A1GAAALOX15HSD17B10USP2 | |
| SCHEMBL29935746 | 0.79 | ALDH1A1 (0.65) | ALDH1A1GAAALOX15HSD17B10USP2 | |
| SCHEMBL335539 | 0.79 | ALDH1A1 (0.65) | ALDH1A1GAAALOX15HSD17B10USP2 | |
| SCHEMBL565006 | 0.78 | MEN1 (0.55) | ALDH1A1GAAALOX15HSD17B10USP2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9975996-B2 | Positive photosensitive resin composition and polyhydroxyamide resin | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-05-22 | — | — | US | claimed |
| US-20160185905-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND POLYHYDROXYAMIDE RESIN | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-06-30 | — | — | US | claimed |
| US-6875554-B2 | Positive photosensitive polyimide resin composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2005-04-05 | — | — | US | claimed |
| WO-2025047700-A1 | COMPOSITION FOR FORMING WAVELENGTH CONVERSION FILM AND USE THEREOF | 日産化学株式会社 | 2025-03-06 | — | — | WO | disclosed |
| WO-2025047702-A1 | COMPOSITION FOR PATTERNING AND USE OF SAME | 日産化学株式会社 | 2025-03-06 | — | — | WO | disclosed |
| WO-2024214539-A1 | COMPOSITION FOR FORMING WAVELENGTH CONVERSION FILM, AND COMPOUND | 日産化学株式会社 | 2024-10-17 | — | — | WO | disclosed |
| WO-2024122572-A1 | WAVELENGTH CONVERSION FILM-FORMING COMPOSITION AND FUSED THIOPHENE COMPOUND | 日産化学株式会社 | 2024-06-13 | — | — | WO | disclosed |
| WO-2024029475-A1 | WAVELENGTH CONVERSION FILM FORMING COMPOSITION | 日産化学株式会社 | 2024-02-08 | — | — | WO | disclosed |
| WO-2023140170-A1 | RING-FUSED THIOPHENE COMPOUND, AND COMPOSITION FOR WAVELENGTH CONVERSION FILM FORMATION USE WHICH CONTAINS SAME | 国立大学法人東海国立大学機構 | 2023-07-27 | — | — | WO | disclosed |
| WO-2023100809-A1 | WAVELENGTH CONVERSION FILM FORMING COMPOSITION | 日産化学株式会社 | 2023-06-08 | — | — | WO | disclosed |
| US-11319514-B2 | Composition for forming a coating film for removing foreign matters | NISSAN CHEMICAL CORPORATION (JP) | 2022-05-03 | — | — | US | disclosed |
| US-7598182-B2 | having monomers of pyromellitic acid, 3,5-diaminobenzoic acid; use in a lithography for forming photoresist pattern | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-10-06 | — | — | US | disclosed |
| US-20070004228-A1 | Polyamide acid-containing composition for forming antireflective film | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2007-01-04 | — | — | US | disclosed |
| EP-1666972-A1 | POLYAMIDE ACID-CONTAINING COMPOSITION FOR FORMING ANTIREFLECTIVE FILM | Nissan Chemical Industries, Ltd. (JP) | 2006-06-07 | — | — | EP | disclosed |
| US-7026080-B2 | Positive photosensitive polyimide resin composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2006-04-11 | — | — | US | disclosed |
| US-20040197699-A1 | Positive photosensitive polyimide resin composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2004-10-07 | — | — | US | disclosed |
| EP-1431822-A1 | POSITIVE PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION | Nissan Chemical Industries, Ltd. (JP) | 2004-06-23 | — | — | EP | disclosed |
| US-6677099-B1 | POLYAMIDEIMIDE DEVELOPED BY AN AQUEOUS ALKALINE SOLUTION AND WHICH IS EXCELLENT IN THE DEVELOPABILITY AND THE ADHESION TO A SUBSTRATE | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2004-01-13 | — | — | US | disclosed |
| EP-1329769-A1 | POSITIVE PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION | Nissan Chemical Industries, Ltd. (JP) | 2003-07-23 | — | — | EP | disclosed |
| EP-1241527-A1 | POSITIVE TYPE PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION | Nissan Chemical Industries, Ltd. (JP) | 2002-09-18 | — | — | EP | disclosed |