Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.70 |
| ▸ | GAA | P10253 | 5/20 | 0.70 |
| ▸ | ALOX15 | P16050 | 5/20 | 0.70 |
| ▸ | HSD17B10 | Q99714 | 4/20 | 0.70 |
| ▸ | HPGD | P15428 | 3/20 | 0.70 |
| ▸ | USP2 | O75604 | 2/20 | 0.70 |
| ▸ | PKM | P14618 | 2/20 | 0.70 |
| ▸ | ALOX12 | P18054 | 3/20 | 0.62 |
| ▸ | HTT | P42858 | 2/20 | 0.62 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.62 |
| ▸ | BCHE | P06276 | 2/20 | 0.45 |
| ▸ | TYR | P14679 | 2/20 | 0.45 |
| ▸ | ACHE | P22303 | 2/20 | 0.45 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.43 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.43 |
| ▸ | SHBG | P04278 | 1/20 | 0.43 |
| ▸ | CYP17A1 | P05093 | 2/20 | 0.43 |
| ▸ | MAPT | P10636 | 4/20 | 0.42 |
| ▸ | MEN1 | O00255 | 3/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19810582 | 0.93 | ALDH1A1 (0.62) | ALDH1A1GAAALOX15HSD17B10HPGD | |
| SCHEMBL18382557 | 0.85 | ALDH1A1 (0.61) | ALDH1A1GAAALOX15HSD17B10HPGD | |
| SCHEMBL14125921 | 0.84 | ALDH1A1 (0.53) | ALDH1A1GAAALOX15HSD17B10HPGD | |
| SCHEMBL272365 | 0.84 | GAA (0.50) | ALDH1A1GAAALOX15HSD17B10HPGD | |
| SCHEMBL8546420 | 0.82 | ALDH1A1 (1.00) | ALDH1A1GAAALOX15HSD17B10HPGD | |
| SCHEMBL13746777 | 0.82 | ALDH1A1 (0.68) | ALDH1A1GAAALOX15HSD17B10HPGD | |
| SCHEMBL1789405 | 0.81 | ALDH1A1 (0.53) | ALDH1A1GAAALOX15HSD17B10HPGD | |
| SCHEMBL3934205 | 0.81 | TDP1 (0.56) | ALDH1A1ALOX15HSD17B10HPGDALOX12 | |
| SCHEMBL30341147 | 0.81 | ALDH1A1 (0.66) | ALDH1A1GAAALOX15HSD17B10HPGD | |
| SCHEMBL5099274 | 0.80 | ALDH1A1 (0.60) | ALDH1A1GAAALOX15HSD17B10HPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 696 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119735806-A | Fluorine-free alkali-soluble resin, composition containing the same, cured film, and pattern processing method | 武汉柔显科技股份有限公司 | 2025-04-01 | — | — | CN | claimed |
| CN-119381692-A | High-temperature-resistant battery diaphragm and preparation method thereof | 东莞市晶致光学薄膜有限公司 | 2025-01-28 | — | — | CN | claimed |
| CN-118108661-B | Diamine monomer with nitrogen heterocycle and benzocyclobutene structure, and preparation method and application thereof | 波米科技有限公司 | 2024-09-20 | — | — | CN | claimed |
| CN-118108661-A | Diamine monomer with nitrogen heterocycle and benzocyclobutene structure, and preparation method and application thereof | 波米科技有限公司 | 2024-05-31 | — | — | CN | claimed |
| CN-114524938-B | Polymer, photosensitive resin composition, cured film prepared from polymer and photosensitive resin composition, and electronic element | 江苏三月科技股份有限公司 | 2024-02-09 | — | — | CN | claimed |
| CN-116490541-A | Optical film having improved optical properties, display device including the same, and method of manufacturing the same | 可隆工业株式会社 | 2023-07-25 | — | — | CN | claimed |
| CN-111522201-B | Positive photosensitive resin composition, cured film prepared from positive photosensitive resin composition and electronic element | 江苏三月科技股份有限公司 | 2023-03-10 | — | — | CN | claimed |
| CN-114315686-B | Alkynyl-containing diamine, preparation method thereof and application thereof in preparation of photosensitive resin composition | 波米科技有限公司 | 2022-09-06 | — | — | CN | claimed |
| CN-114524938-A | Polymer, photosensitive resin composition, cured film prepared from same and electronic element | 江苏三月科技股份有限公司 | 2022-05-24 | — | — | CN | claimed |
| CN-114315686-A | Alkynyl-containing diamine, preparation method thereof and application thereof in preparation of photosensitive resin composition | 波米科技有限公司 | 2022-04-12 | — | — | CN | claimed |
| CN-104804189-A | Semi-alicyclic polyimide containing phenolic hydroxyl groups, and preparation method and application thereof | NANXIONG MATERIAL PRODUCTION BASE OF GUANGZHOU INST OF CHEMISTRY CHINESE ACADEMY OF SCIENCES | 2015-07-29 | — | — | CN | claimed |
| EP-2011842-B1 | PHOTOSENSITIVE INK COMPOSITION FOR SCREEN PRINTING AND METHOD OF FORMING POSITIVE RELIEF PATTERN WITH USE THEREOF | PI R & D CO LTD (JP) | 2014-02-26 | — | — | EP | claimed |
| US-8449978-B2 | Insulated wire and insulating varnish used therefor | HITACHI CABLE, LTD. (JP) | 2013-05-28 | — | — | US | claimed |
| US-8349537-B2 | Photosensitive ink composition for screen printing and method of forming positive relief pattern with use thereof | PI R&D CO., LTD. (JP) | 2013-01-08 | — | — | US | claimed |
| US-20110111351-A1 | Photosensitive Ink Composition for Screen Printing and Method of Forming Positive Relief Pattern with Use Thereof | WIN MAW SOE | 2011-05-12 | — | — | US | claimed |
| US-20090186295-A1 | Photosensitive Ink Composition for Screen Printing and Method of Forming Positive Relief Pattern with Use Thereof | PI R&D CO., LTD. (JP) | 2009-07-23 | — | — | US | claimed |
| EP-2011842-A1 | PHOTOSENSITIVE INK COMPOSITION FOR SCREEN PRINTING AND METHOD OF FORMING POSITIVE RELIEF PATTERN WITH USE THEREOF | PI R & D Co., Ltd. (JP) | 2009-01-07 | — | — | EP | claimed |
| EP-1262509-B1 | IMIDE-BENZOXAZOLE POLYCONDENSATE AND PROCESS FOR PRODUCING THE SAME | PI R & D CO LTD (JP) | 2007-01-10 | — | — | EP | claimed |
| US-6890626-B1 | Imide-benzoxazole polycondensate and process for producing the same | PI R&D CO., LTD. (JP) | 2005-05-10 | — | — | US | claimed |
| EP-1262509-A1 | IMIDE-BENZOXAZOLE POLYCONDENSATE AND PROCESS FOR PRODUCING THE SAME | PI R & D Co., Ltd. (JP) | 2002-12-04 | — | — | EP | claimed |