SCHEMBL17899095

SCHEMBL17899095

CC(F)(F)COC(=O)OCC(F)(F)C(F)(F)COC(=O)C12CC3CC(CC(O)(C3)C1)C2

nearest known ligand 0.47

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.47
NPSR1 Q6W5P4 2/20 0.43
ABL1 P00519 1/20 0.43
TSHR P16473 1/20 0.43
RIN1 Q13671 1/20 0.43
L3MBTL1 Q9Y468 2/20 0.42
NPC1 O15118 5/20 0.40
RAB9A P51151 5/20 0.40
LMNA P02545 1/20 0.39
USP2 O75604 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
HSD11B1 P28845 2/20 0.38
POLB P06746 1/20 0.38
GAA P10253 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL685292 0.92 ALDH1A1 (0.53) ALDH1A1NPSR1ABL1TSHRRIN1
SCHEMBL17899103 0.86 ALDH1A1 (0.48) ALDH1A1NPSR1ABL1TSHRRIN1
SCHEMBL14727757 0.85 ALDH1A1 (0.47) ALDH1A1NPSR1ABL1TSHRRIN1
SCHEMBL17902851 0.85 ALDH1A1 (0.45) ALDH1A1NPSR1ABL1TSHRRIN1
SCHEMBL17899109 0.85 ALDH1A1 (0.51) ALDH1A1NPSR1ABL1TSHRRIN1
SCHEMBL17828626 0.84 ALDH1A1 (0.54) ALDH1A1NPSR1ABL1TSHRRIN1
SCHEMBL14727759 0.83 ALDH1A1 (0.46) ALDH1A1NPSR1ABL1TSHRRIN1
SCHEMBL26013675 0.82 ALDH1A1 (0.51) ALDH1A1NPSR1ABL1TSHRRIN1
SCHEMBL12972003 0.82 NPSR1 (0.48) ALDH1A1NPSR1ABL1TSHRRIN1
SCHEMBL18031806 0.82 ALDH1A1 (0.46) ALDH1A1NPSR1ABL1TSHRRIN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9575408-B2 Photoresist composition and method for producing photoresist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-02-21 US disclosed
US-20160195809-A1 PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-07-07 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20160195809-A1 PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN RER1, LCP1, COL1A1 ALDH1A1 914/4885NPSR1 1042/4885ABL1 737/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.