SCHEMBL17899109

SCHEMBL17899109

O=C(OCC(F)(F)C(F)(F)CO)C12CC3CC(CC(O)(C3)C1)C2

nearest known ligand 0.51

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.51
NPSR1 Q6W5P4 2/20 0.44
ABL1 P00519 1/20 0.43
TSHR P16473 1/20 0.43
RIN1 Q13671 1/20 0.43
NPC1 O15118 5/20 0.43
RAB9A P51151 5/20 0.43
L3MBTL1 Q9Y468 3/20 0.42
LMNA P02545 1/20 0.42
GAA P10253 1/20 0.41
HSD11B1 P28845 2/20 0.40
USP2 O75604 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
POLB P06746 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17899103 0.86 ALDH1A1 (0.48) ALDH1A1NPSR1ABL1TSHRRIN1
SCHEMBL18031822 0.86 PRKCA (0.48) ALDH1A1NPSR1LMNAGAA
SCHEMBL17899095 0.85 ALDH1A1 (0.47) ALDH1A1NPSR1ABL1TSHRRIN1
SCHEMBL18031806 0.84 ALDH1A1 (0.46) ALDH1A1NPSR1ABL1TSHRRIN1
SCHEMBL3208886 0.83 ALDH1A1 (0.53) ALDH1A1NPSR1ABL1TSHRRIN1
SCHEMBL685292 0.83 ALDH1A1 (0.53) ALDH1A1NPSR1ABL1TSHRRIN1
SCHEMBL17902841 0.83 ALDH1A1 (0.46) ALDH1A1NPSR1ABL1TSHRRIN1
SCHEMBL24361222 0.82 ALDH1A1 (0.52) ALDH1A1NPSR1ABL1TSHRRIN1
SCHEMBL17902851 0.82 ALDH1A1 (0.45) ALDH1A1NPSR1ABL1TSHRRIN1
SCHEMBL26013675 0.81 ALDH1A1 (0.51) ALDH1A1NPSR1ABL1TSHRRIN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9575408-B2 Photoresist composition and method for producing photoresist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-02-21 US disclosed
US-9575408-B2 Photoresist composition and method for producing photoresist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-02-21 US disclosed
US-20160195809-A1 PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-07-07 US disclosed
US-20160195809-A1 PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-07-07 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20160195809-A1 PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN RER1, LCP1, COL1A1 ALDH1A1 914/4885NPSR1 1042/4885ABL1 737/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.