SCHEMBL17902874

SCHEMBL17902874

O=C(OCC(F)(F)C(F)(F)COC(=O)C(F)(F)S(=O)(=O)O)C12CC3CC(CC(C3)C1)C2

nearest known ligand 0.40

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 10/20 0.40
MAPT P10636 4/20 0.40
KMT2A Q03164 3/20 0.40
NPSR1 Q6W5P4 3/20 0.40
MEN1 O00255 2/20 0.40
PRKCA P17252 1/20 0.39
PKM P14618 1/20 0.38
CYP17A1 P05093 2/20 0.37
CYP19A1 P11511 2/20 0.37
ATM Q13315 1/20 0.34
GAA P10253 2/20 0.34
RECQL P46063 1/20 0.33
XBP1 P17861 1/20 0.33
CYP1A2 P05177 1/20 0.32
CYP3A4 P08684 1/20 0.32
CYP2D6 P10635 1/20 0.32
CYP2C9 P11712 1/20 0.32
CYP2C19 P33261 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17902834 0.90 NPSR1 (0.34) ALDH1A1MAPTKMT2ANPSR1MEN1
SCHEMBL17902841 0.88 ALDH1A1 (0.46) ALDH1A1NPSR1GAASMN1; SMN2
SCHEMBL17902873 0.86 MEN1 (0.31) ALDH1A1MAPTKMT2ANPSR1MEN1
SCHEMBL2734363 0.86 ALDH1A1 (0.41) ALDH1A1MAPTKMT2ANPSR1MEN1
SCHEMBL12977829 0.86 ALDH1A1 (0.41) ALDH1A1MAPTKMT2ANPSR1MEN1
SCHEMBL17902835 0.85 MEN1 (0.31) ALDH1A1MAPTKMT2ANPSR1MEN1
SCHEMBL26437483 0.85 ALDH1A1 (0.42) ALDH1A1MAPTKMT2ANPSR1MEN1
SCHEMBL17902871 0.84 PKM (0.31) ALDH1A1KMT2AMEN1PKMCYP17A1
SCHEMBL17902872 0.84
SCHEMBL26437481 0.83 ALDH1A1 (0.41) ALDH1A1MAPTKMT2ANPSR1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9575408-B2 Photoresist composition and method for producing photoresist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-02-21 US disclosed
US-20160195809-A1 PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-07-07 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20160195809-A1 PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN RER1, LCP1, COL1A1 ALDH1A1 914/4885MAPT 286/4885KMT2A 1576/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.