Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC6A3 known ✓ | Q01959 | 1/20 | 0.41 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.53 |
| ▸ | POLB | P06746 | 1/20 | 0.47 |
| ▸ | DAO | P14920 | 2/20 | 0.46 |
| ▸ | TSHR | P16473 | 2/20 | 0.46 |
| ▸ | NAPRT | Q6XQN6 | 1/20 | 0.46 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.44 |
| ▸ | SRD5A2 | P31213 | 2/20 | 0.43 |
| ▸ | NR4A1 | P22736 | 1/20 | 0.43 |
| ▸ | NR4A2 | P43354 | 1/20 | 0.43 |
| ▸ | NR4A3 | Q92570 | 1/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.42 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.42 |
| ▸ | LMNA | P02545 | 1/20 | 0.42 |
| ▸ | HTT | P42858 | 1/20 | 0.42 |
| ▸ | NPC1 | O15118 | 1/20 | 0.42 |
| ▸ | CASP3 | P42574 | 1/20 | 0.42 |
| ▸ | RAB9A | P51151 | 1/20 | 0.42 |
| ▸ | SENP8 | Q96LD8 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL124485 | 0.87 | RARB (0.49) | CYP2D6DAOTSHRNAPRTSRD5A2 | |
| SCHEMBL124806 | 0.86 | MAPT (0.49) | ALDH1A1SMN1; SMN2NPC1CASP3RAB9A | |
| SCHEMBL124519 | 0.84 | MAPT (0.51) | ALDH1A1SMN1; SMN2NPC1CASP3RAB9A | |
| SCHEMBL127407 | 0.81 | ALDH1A1 (0.52) | DAOTSHRNAPRTALDH1A1SMN1; SMN2 | |
| SCHEMBL125796 | 0.81 | CYP2D6 (0.73) | CYP2D6DAOTSHRNAPRTKEAP1 | |
| Hydrochloric Acid SCHEMBL2006408 | 0.80 | CYP2D6 (0.49) | CYP2D6ALDH1A1HSD17B10SMN1; SMN2LMNA | |
| Terephthalic Acid SCHEMBL1887306 | 0.78 | TSHR (0.62) | DAOTSHRNAPRTKEAP1SRD5A2 | |
| Benzoic Acid SCHEMBL4779307 | 0.78 | DAO (0.70) | DAOTSHRNAPRTKEAP1SRD5A2 | |
| SCHEMBL10445050 | 0.78 | CYP2D6 (0.50) | CYP2D6ALDH1A1HSD17B10SMN1; SMN2TDP1 | |
| Bromide SCHEMBL8971000 | 0.76 | SMN1; SMN2 (0.55) | ALDH1A1SMN1; SMN2HTTNPC1RAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12546027-B2 | Anode for electroplating, and method and system for electroplating articles with metal | DIPSOL CHEMICALS CO., LTD. (JP) | 2026-02-10 | — | — | US | disclosed |
| US-12428745-B2 | Method and system for electroplating parts with metal | DIPSOL CHEMICALS CO., LTD. (JP) | 2025-09-30 | — | — | US | disclosed |
| EP-4524295-A2 | METHOD AND SYSTEM FOR ELECTROPLATING ARTICLE WITH METAL | Dipsol Chemicals Co., Ltd. (JP) | 2025-03-19 | — | — | EP | disclosed |
| US-20240392461-A1 | METHOD AND SYSTEM FOR ELECTROPLATING ARTICLE WITH METAL | DIPSOL CHEM (JP) | 2024-11-28 | — | — | US | disclosed |
| US-20240337041-A1 | ANODE FOR ELECTROPLATING, AND METHOD AND SYSTEM FOR ELECTROPLATING ARTICLES WITH METAL | DIPSOL CHEMICALS CO., LTD. (JP) | 2024-10-10 | — | — | US | disclosed |
| EP-4421216-A1 | ANODE FOR ELECTROPLATING, AND METHOD AND SYSTEM FOR ELECTROPLATING ARTICLE WITH METAL | Dipsol Chemicals Co., Ltd. (JP) | 2024-08-28 | — | — | EP | disclosed |
| WO-2024111515-A1 | ANODE FOR ELECTROPLATING, AND METHOD AND SYSTEM FOR ELECTROPLATING ARTICLE WITH METAL | ディップソール株式会社 | 2024-05-30 | — | — | WO | disclosed |
| US-20230349063-A1 | Method and System for Electroplating Parts with Metal | DIPSOL CHEMICALS CO., LTD. (JP) | 2023-11-02 | — | — | US | disclosed |
| EP-4269663-A1 | METHOD AND SYSTEM FOR ELECTROPLATING ARTICLE WITH METAL | Dipsol Chemicals Co., Ltd. (JP) | 2023-11-01 | — | — | EP | disclosed |
| US-20230304182-A1 | ELECTRODEPOSITED ZINC AND IRON COATINGS FOR CORROSION RESISTANCE | THE BOEING COMPANY | 2023-09-28 | — | — | US | disclosed |
| EP-3715506-A1 | ZINC OR ZINC ALLOY ELECTROPLATING METHOD AND SYSTEM | Dipsol Chemicals Co., Ltd. (JP) | 2020-09-30 | — | — | EP | disclosed |
| US-20200263314-A1 | ZINC OR ZINC ALLOY ELECTROPLATING METHOD AND SYSTEM | DIPSOL CHEMICALS CO., LTD. (JP) | 2020-08-20 | — | — | US | disclosed |
| EP-3042985-B1 | ZINC ALLOY PLATING METHOD | DIPSOL CHEM (JP) | 2019-04-10 | — | — | EP | disclosed |
| EP-3042984-B1 | ZINC ALLOY PLATING METHOD | DIPSOL CHEM (JP) | 2019-04-03 | — | — | EP | disclosed |
| US-10156020-B2 | Zinc alloy plating method | DIPSOL CHEMICALS CO., LTD. (JP) | 2018-12-18 | — | — | US | disclosed |
| US-9903038-B2 | Zinc alloy plating method | DIPSOL CHEMICALS CO., LTD. (JP) | 2018-02-27 | — | — | US | disclosed |
| US-20170022621-A1 | ZINC ALLOY PLATING METHOD | DIPSOL CHEMICALS CO., LTD. (JP) | 2017-01-26 | — | — | US | disclosed |
| US-20170022625-A1 | ZINC ALLOY PLATING METHOD | DIPSOL CHEMICALS CO., LTD. (JP) | 2017-01-26 | — | — | US | disclosed |
| EP-3042984-A1 | ZINC ALLOY PLATING METHOD | Dipsol Chemicals Co., Ltd. (JP) | 2016-07-13 | — | — | EP | disclosed |
| EP-3042985-A1 | ZINC ALLOY PLATING METHOD | Dipsol Chemicals Co., Ltd. (JP) | 2016-07-13 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12546027-B2 | Anode for electroplating, and method and system for electroplating articles with metal | DCX, CACNA2D3, CACNA2D4 | SLC6A3 554/4885CYP2D6 3989/4885POLB 73/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.