SCHEMBL1794694

SCHEMBL1794694

CCC[Ti](OCC)(OCC)OCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1791815 0.81 TSHR (0.33)
SCHEMBL21457787 0.78
SCHEMBL22712597 0.77 TSHR (0.42)
SCHEMBL15453552 0.73
SCHEMBL436115 0.72
SCHEMBL483130 0.71 TSHR (0.36)
SCHEMBL483477 0.71 DNM1 (0.33)
SCHEMBL5070092 0.69 DNM1 (0.38)
SCHEMBL2140199 0.69 OPRM1 (0.39)
SCHEMBL8855955 0.68 ALDH1A1 (0.39)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107209303-B Far infrared ray reflective film, dispersion for forming far infrared ray reflective film, method for producing far infrared ray reflective film, far infrared ray reflective glass, and window 富士胶片株式会社 2020-07-14 CN disclosed
US-10589494-B2 Far infrared reflective film, dispersion for forming far infrared reflective film, manufacturing method of far infrared reflective film, far infrared reflective glass, and window FUJIFILM CORPORATION (JP) 2020-03-17 US disclosed
CN-106029743-B Composition containing polyimide precursor and/or polyimide, and polyimide film 三菱化学株式会社 2019-03-29 CN disclosed
US-20180079917-A1 HEAT INSULATION PAINT FUJIFILM CORPORATION (JP) 2018-03-22 US disclosed
US-20170320302-A1 FAR INFRARED REFLECTIVE FILM, DISPERSION FOR FORMING FAR INFRARED REFLECTIVE FILM, MANUFACTURING METHOD OF FAR INFRARED REFLECTIVE FILM, FAR INFRARED REFLECTIVE GLASS, AND WINDOW FUJIFILM CORPORATION (JP) 2017-11-09 US disclosed
US-20170054098-A1 ORGANIC ELECTROLUMINESCENT ELEMENT Konica Minolta, Inc. (JP) 2017-02-23 US disclosed
CN-106029743-A Composition containing polyimide precursor and/or polyimide, and polyimide film 三菱化学株式会社 2016-10-12 CN disclosed
CN-105612441-A Polyimide composition, and alignment film and optical element formed using same MITSUBISHI CHEM CORP 2016-05-25 CN disclosed
US-9343594-B2 Conductive composition, conductive member and production method thereof, touch panel, and solar cell FUJIFILM CORPORATION (JP) 2016-05-17 US disclosed
CN-104011600-B Electrophotography component, handle box and electronic photographing device CANON KABUSHIKI KAISHA (JP) 2016-02-24 CN disclosed
CN-101558054-A Optical film and retardation sheet, and liquid crystal compound FUJIFILM CORP (JP) 2009-10-14 CN disclosed
US-20080292983-A1 Magnetic One-Component Toner for Development of Electrostatic Latent Image and Image Forming Method KYOCERA MITA CORPORATION (JP) 2008-11-27 US disclosed
CN-100401196-C Organic toner and picture forming method using same KYOCERA CORP (JP) 2008-07-09 CN disclosed
CN-101002144-A Magnetic one-component toner for developing electrostatic latent image and method for forming image KYOCERA MITA CORP (JP) 2007-07-18 CN disclosed
US-20070072104-A1 Toner and image forming method KYOCERA MITA CORPORATION (JP) 2007-03-29 US disclosed
CN-1752845-A Ray sensitive resin composition for forming interlayer insulation film and interlayer insulation film JSR CORP (JP) 2006-03-29 CN disclosed
US-6852460-B2 Toner and image forming method using the same KYOCERA CORPORATION (JP) 2005-02-08 US disclosed
CN-1552654-A Irregular decorative pattern coating glass container and producing method thereof 上海高雅玻璃有限公司 2004-12-08 CN disclosed
US-20030186151-A1 Toner and image forming method using the same KYOCERA CORPORATION 2003-10-02 US disclosed
CN-1383037-A Organic toner and picture forming method using same KYOCERA CORP (JP) 2002-12-04 CN disclosed