SCHEMBL18012799

SCHEMBL18012799

CC(=O)O/N=C(\C)C(=O)c1ccc2c(c1)C(C)(C)c1cc(C(=O)/C(C)=N/OC(C)=O)ccc1-2

nearest known ligand 0.40

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 3/20 0.40
▸ POLB P06746 1/20 0.40
▸ SMN1; SMN2 Q16637 1/20 0.40
▸ KMT2A Q03164 1/20 0.40
▸ L3MBTL1 Q9Y468 1/20 0.40
▸ HTR7 P34969 4/20 0.34
▸ HTR2B P41595 4/20 0.34
▸ PDK2 Q15119 3/20 0.34
▸ PKM P14618 1/20 0.34
▸ NPC1 O15118 1/20 0.33
▸ RAB9A P51151 1/20 0.33
▸ KDM4E B2RXH2 2/20 0.32
▸ RXRA P19793 1/20 0.32
▸ RXRB P28702 1/20 0.32
▸ RXRG P48443 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18235835 0.93 PDK2 (0.41) MAPTPOLBSMN1; SMN2KMT2AL3MBTL1
SCHEMBL20032517 0.93 PDK2 (0.41) MAPTPOLBSMN1; SMN2KMT2AL3MBTL1
SCHEMBL18012798 0.85 KMT2A (0.47) MAPTSMN1; SMN2KMT2AL3MBTL1PKM
SCHEMBL18012784 0.85 RAB9A (0.41) MAPTPOLBSMN1; SMN2KMT2AL3MBTL1
SCHEMBL18012814 0.85 MAPT (0.38) MAPTPOLBSMN1; SMN2KMT2AL3MBTL1
SCHEMBL20032405 0.84 PDK2 (0.40) MAPTPOLBSMN1; SMN2KMT2AL3MBTL1
SCHEMBL18012786 0.83 CES2 (0.35) MAPTSMN1; SMN2KMT2AL3MBTL1PKM
SCHEMBL18235842 0.81 PDK2 (0.38) MAPTPOLBSMN1; SMN2KMT2AL3MBTL1
SCHEMBL18012800 0.81 RAB9A (0.47) MAPTPOLBSMN1; SMN2KMT2AL3MBTL1
SCHEMBL18012730 0.80 MAPT (0.35) MAPTPOLBSMN1; SMN2KMT2AL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2016126070-A1 NOVEL OXIMESTER DERIVATIVE COMPOUND, AND PHOTOPOLYMERIZATION INITIATOR AND PHOTORESIST COMPOSITION CONTAINING SAME 한국화학연구원 2016-08-11 — — WO disclosed
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