SCHEMBL18012784

SCHEMBL18012784

CC(=O)O/N=C(\C)c1ccc2c(c1)C(C)(C)c1cc(/C(C)=N/OC(C)=O)ccc1-2

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ RAB9A P51151 2/20 0.41
▸ PDK2 Q15119 3/20 0.38
▸ MAPT P10636 3/20 0.37
▸ NPY1R P25929 1/20 0.37
▸ NPY2R P49146 1/20 0.37
▸ CYP1A2 P05177 1/20 0.37
▸ MEN1 O00255 1/20 0.36
▸ POLB P06746 1/20 0.36
▸ KMT2A Q03164 1/20 0.36
▸ PKM P14618 2/20 0.36
▸ CDK5 Q00535 1/20 0.36
▸ CDK5R1 Q15078 1/20 0.36
▸ PDE4B Q07343 1/20 0.36
▸ PDE4D Q08499 1/20 0.36
▸ MAPK14 Q16539 1/20 0.36
▸ KCNH2 Q12809 1/20 0.35
▸ NPC1 O15118 1/20 0.34
▸ CASP3 P42574 1/20 0.34
▸ SENP8 Q96LD8 1/20 0.34
▸ SENP7 Q9BQF6 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17877630 0.89 PDK2 (0.48) PDK2MAPTCYP1A2PKMCDK5
SCHEMBL18673350 0.88 ALK (0.44) RAB9APDK2MAPTNPC1L3MBTL1
SCHEMBL18852824 0.85 ALDH1A1 (0.39) RAB9APDK2MAPTNPY1RNPY2R
SCHEMBL18012799 0.85 MAPT (0.40) RAB9APDK2MAPTPOLBKMT2A
SCHEMBL18012642 0.84 RAB9A (0.39) RAB9APDK2MAPTNPY1RNPY2R
SCHEMBL18012823 0.83 SMN1; SMN2 (0.39) RAB9AMAPTMEN1KMT2APKM
SCHEMBL18012775 0.82 PKM (0.41) RAB9APDK2MAPTMEN1KMT2A
SCHEMBL19307923 0.82 ALDH1A1 (0.37) RAB9APDK2MAPTNPY1RNPY2R
SCHEMBL18012772 0.81 RXRA (0.42) PDK2MAPTMEN1POLBKMT2A
SCHEMBL16480349 0.80 MAPT (0.31) MAPTNPY1RNPY2RPDE4BPDE4D

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2016126070-A1 NOVEL OXIMESTER DERIVATIVE COMPOUND, AND PHOTOPOLYMERIZATION INITIATOR AND PHOTORESIST COMPOSITION CONTAINING SAME 한국화학연구원 2016-08-11 — — WO disclosed
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