SCHEMBL18016202

SCHEMBL18016202

CC(C)(C)c1ccc(O)c2c1C(=O)OC2=O

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.42
TDP1 Q9NUW8 2/20 0.42
TSHR P16473 1/20 0.42
ALOX15 P16050 3/20 0.39
HSD17B10 Q99714 2/20 0.39
NR1I2 O75469 1/20 0.39
LMNA P02545 1/20 0.39
CYP2C9 P11712 1/20 0.39
MIF P14174 1/20 0.39
TYR P14679 1/20 0.39
HTT P42858 1/20 0.39
NFE2L2 Q16236 1/20 0.39
CA2 P00918 1/20 0.39
MAPT P10636 3/20 0.37
CYP1A2 P05177 2/20 0.37
KDM4E B2RXH2 2/20 0.37
ATP2A2 P16615 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
ATP2A3 Q93084 1/20 0.37
MAOA P21397 6/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2431693 0.81 MAOA (0.50) ALDH1A1TDP1TSHRALOX15HSD17B10
SCHEMBL7702950 0.74 ALDH1A1 (0.48) ALDH1A1TDP1TSHRALOX15HSD17B10
SCHEMBL7074292 0.71 TDP1 (0.44) ALDH1A1TDP1TSHRALOX15CA2
SCHEMBL29169320 0.70 ALDH1A1 (0.65) ALDH1A1TDP1TSHRALOX15HSD17B10
SCHEMBL29888677 0.70 ALDH1A1 (0.65) ALDH1A1TDP1TSHRALOX15HSD17B10
Benzene SCHEMBL16500004 0.69 CA2 (0.48) ALDH1A1TDP1TSHRALOX15HSD17B10
SCHEMBL8750898 0.69 ALDH1A1 (0.46) ALDH1A1TDP1TSHRALOX15HSD17B10
SCHEMBL9235789 0.68 ALDH1A1 (0.45) ALDH1A1TDP1TSHRALOX15HSD17B10
SCHEMBL18016214 0.67 ALDH1A1 (0.37) ALDH1A1TDP1TSHRALOX15HSD17B10
SCHEMBL2497618 0.67 ALDH1A1 (0.59) ALDH1A1TDP1TSHRALOX15HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9448480-B2 Resist underlayer film formation composition and method for forming resist pattern using the same NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-09-20 US disclosed
US-9448480-B2 Resist underlayer film formation composition and method for forming resist pattern using the same NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-09-20 US disclosed
US-20160238936-A1 RESIST UNDERLAYER FILM FORMATION COMPOSITION AND METHOD FOR FORMING RESIST PATTERN USING THE SAME NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-08-18 US disclosed
US-20160238936-A1 RESIST UNDERLAYER FILM FORMATION COMPOSITION AND METHOD FOR FORMING RESIST PATTERN USING THE SAME NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-08-18 US disclosed