SCHEMBL18017191

SCHEMBL18017191

O=C(c1ccccc1)c1ccc2ccc3c(C(=O)c4ccc5ccccc5c4)ccc4ccc1c2c43

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 4/20 0.53
MEN1 O00255 3/20 0.53
NPC1 O15118 1/20 0.53
RAB9A P51151 1/20 0.53
MAPT P10636 2/20 0.51
MAPK1 P28482 2/20 0.51
SMN1; SMN2 Q16637 2/20 0.51
CES2 O00748 1/20 0.49
CES1 P23141 1/20 0.49
ACHE P22303 1/20 0.47
KDM4E B2RXH2 3/20 0.46
HSD17B14 Q9BPX1 1/20 0.45
CLK1 P49759 1/20 0.45
DYRK1A Q13627 1/20 0.45
DYRK1B Q9Y463 1/20 0.45
HSD17B10 Q99714 3/20 0.44
ALDH1A1 P00352 2/20 0.44
HPGD P15428 2/20 0.44
CYP1A2 P05177 1/20 0.44
GLA P06280 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21246148 0.88 MEN1 (0.50) KMT2AMEN1NPC1RAB9AMAPT
SCHEMBL8598610 0.87 KMT2A (0.57) KMT2AMEN1MAPTACHEKDM4E
SCHEMBL15855770 0.87 AKR1C3 (0.48) KMT2AMEN1NPC1RAB9AMAPT
Ethyne SCHEMBL8599405 0.84 KMT2A (0.54) KMT2AMEN1MAPTACHEKDM4E
SCHEMBL21246147 0.83 CYP1A2 (0.53) KMT2AMEN1MAPTACHEKDM4E
SCHEMBL18017189 0.83 CES2 (0.50) KMT2AMEN1NPC1RAB9AMAPT
SCHEMBL2014295 0.81 BCL2 (0.58) KMT2AMEN1NPC1RAB9AMAPT
SCHEMBL124894 0.81 MEN1 (0.75) KMT2AMEN1NPC1RAB9AMAPT
SCHEMBL29834246 0.81 MEN1 (0.75) KMT2AMEN1NPC1RAB9AMAPT
SCHEMBL10534461 0.81 KDM4E (0.54) KMT2AMEN1MAPTKDM4EHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9758612-B2 Polymer, organic layer composition, organic layer, and method of forming patterns SAMSUNG SDI CO., LTD. (KR) 2017-09-12 US disclosed
US-9758612-B2 Polymer, organic layer composition, organic layer, and method of forming patterns SAMSUNG SDI CO., LTD. (KR) 2017-09-12 US disclosed
US-20160237195-A1 POLYMER, ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND METHOD OF FORMING PATTERNS SAMSUNG SDI CO., LTD. (KR) 2016-08-18 US disclosed
US-20160237195-A1 POLYMER, ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND METHOD OF FORMING PATTERNS SAMSUNG SDI CO., LTD. (KR) 2016-08-18 US disclosed