SCHEMBL21246148

SCHEMBL21246148

O=C(c1ccccc1)c1cc2ccc3ccc4c(C(=O)c5ccc6ccccc6c5)cc5ccc6ccc1c1c6c5c4c3c21

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 4/20 0.50
KMT2A Q03164 4/20 0.50
NPC1 O15118 1/20 0.50
RAB9A P51151 1/20 0.50
MAPT P10636 2/20 0.49
MAPK1 P28482 2/20 0.49
SMN1; SMN2 Q16637 2/20 0.49
CES2 O00748 1/20 0.46
CES1 P23141 1/20 0.46
ACHE P22303 1/20 0.45
HSD17B14 Q9BPX1 1/20 0.43
CLK1 P49759 1/20 0.43
DYRK1A Q13627 1/20 0.43
DYRK1B Q9Y463 1/20 0.43
IGFBP3 P17936 1/20 0.41
TDP1 Q9NUW8 2/20 0.41
KDM4E B2RXH2 2/20 0.41
ATM Q13315 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
ALDH1A1 P00352 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18017189 0.95 CES2 (0.50) MEN1KMT2ANPC1RAB9AMAPT
SCHEMBL17192495 0.91 AKR1C3 (0.46) MEN1KMT2ANPC1RAB9AMAPT
SCHEMBL16241710 0.91 AKR1C3 (0.46) MEN1KMT2ANPC1RAB9AMAPT
SCHEMBL18017191 0.88 KMT2A (0.53) MEN1KMT2ANPC1RAB9AMAPT
SCHEMBL16919560 0.88 ACHE (0.46) MEN1KMT2ANPC1RAB9AMAPT
SCHEMBL16919764 0.88 NPC1 (0.50) MEN1KMT2ANPC1RAB9AMAPT
SCHEMBL16241704 0.80 HPGD (0.47) MEN1KMT2ANPC1RAB9AMAPT
SCHEMBL124894 0.79 MEN1 (0.75) MEN1KMT2ANPC1RAB9AMAPT
SCHEMBL29834246 0.79 MEN1 (0.75) MEN1KMT2ANPC1RAB9AMAPT
SCHEMBL17256438 0.78 MEN1 (0.46) MEN1KMT2ANPC1RAB9AMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11126084-B2 Composition for resist underlayer film formation, resist underlayer film and forming method thereof, production method of patterned substrate, and compound JSR CORPORATION (JP) 2021-09-21 US disclosed
US-20190243247-A1 COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER FILM AND FORMING METHOD THEREOF, PRODUCTION METHOD OF PATTERNED SUBSTRATE, AND COMPOUND JSR CORPORATION (JP) 2019-08-08 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11126084-B2 Composition for resist underlayer film formation, resist underlayer film and forming method thereof, production method of patterned substrate, and compound EMG1, FN1, TOP1 MEN1 115/4885KMT2A 448/4885NPC1 1115/4885
US-20190243247-A1 COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER FILM AND FORMING METHOD THEREOF, PRODUCTION METHOD OF PATTERNED SUBSTRATE, AND COMPOUND EMG1, FN1, TOP1 MEN1 115/4885KMT2A 448/4885NPC1 1115/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.