Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HCAR3 | P49019 | 5/20 | 0.60 |
| ▸ | FGFR1 | P11362 | 3/20 | 0.53 |
| ▸ | HPGD | P15428 | 4/20 | 0.53 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.50 |
| ▸ | LMNA | P02545 | 1/20 | 0.50 |
| ▸ | TSHR | P16473 | 1/20 | 0.49 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.49 |
| ▸ | THRB | P10828 | 1/20 | 0.48 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.47 |
| ▸ | GAA | P10253 | 1/20 | 0.47 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.47 |
| ▸ | RXRA | P19793 | 1/20 | 0.45 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18031573 | 0.83 | FGFR1 (0.46) | HCAR3FGFR1HPGDGAASMN1; SMN2 | |
| SCHEMBL6174196 | 0.81 | HCAR3 (0.53) | HCAR3FGFR1HPGDALDH1A1LMNA | |
| SCHEMBL28227235 | 0.79 | FGFR1 (0.60) | HCAR3FGFR1HPGDALDH1A1LMNA | |
| SCHEMBL5036251 | 0.77 | FGFR1 (0.57) | HCAR3FGFR1HPGDALDH1A1LMNA | |
| SCHEMBL18033712 | 0.76 | HCAR3 (0.60) | HCAR3HPGDHCAR2 | |
| SCHEMBL18033714 | 0.75 | FGFR1 (0.53) | HCAR3FGFR1HPGDALDH1A1LMNA | |
| SCHEMBL14315485 | 0.74 | KMT2A (0.46) | HCAR3FGFR1HPGDALDH1A1LMNA | |
| SCHEMBL18156658 | 0.74 | ALDH1A1 (0.47) | HCAR3FGFR1HPGDALDH1A1LMNA | |
| SCHEMBL18033701 | 0.74 | ALDH1A1 (0.47) | HCAR3FGFR1HPGDALDH1A1LMNA | |
| SCHEMBL599310 | 0.73 | HCAR3 (0.65) | HCAR3FGFR1HPGDALDH1A1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9740098-B2 | Chemically amplified negative resist composition using novel onium salt and resist pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-08-22 | — | — | US | disclosed |
| US-9720323-B2 | Chemically amplified positive resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-08-01 | — | — | US | disclosed |
| EP-3081987-A2 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION USING NOVEL ONIUM SALT AND RESIST PATTERN FORMING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2016-10-19 | — | — | EP | disclosed |
| US-20160299428-A1 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION USING NOVEL ONIUM SALT AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-10-13 | — | — | US | disclosed |
| EP-3062150-A2 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2016-08-31 | — | — | EP | disclosed |
| US-20160246175-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-08-25 | — | — | US | disclosed |