SCHEMBL18101032

SCHEMBL18101032

COCc1cc(C2(c3cc(COC)c(O)c(C(C)C)c3)c3ccccc3-c3ccccc32)cc(C(C)C)c1O

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 1/20 0.43
ESR2 Q92731 1/20 0.43
PDK2 Q15119 3/20 0.37
MAPT P10636 4/20 0.35
TP53 P04637 3/20 0.35
LMNA P02545 2/20 0.35
CYP1A2 P05177 2/20 0.35
CYP3A4 P08684 2/20 0.35
CYP2D6 P10635 2/20 0.35
CYP2C9 P11712 2/20 0.35
ALOX15 P16050 2/20 0.35
CYP2C19 P33261 2/20 0.35
EGFR P00533 1/20 0.35
ERBB2 P04626 1/20 0.35
IGF1R P08069 1/20 0.35
PDGFRB P09619 1/20 0.35
NOX4 Q9NPH5 1/20 0.35
PAX8 Q06710 1/20 0.35
HIF1A Q16665 1/20 0.35
NPSR1 Q6W5P4 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10076748 0.88 ESR1 (0.50) ESR1ESR2PDK2MAPTTP53
SCHEMBL18100870 0.88 ESR1 (0.41) ESR1ESR2PDK2MAPTTP53
SCHEMBL18100879 0.84 ESR1 (0.54) ESR1ESR2PDK2MAPTTP53
SCHEMBL2884823 0.83 ESR1 (0.50) ESR1ESR2PDK2MAPTTP53
SCHEMBL18100873 0.81
SCHEMBL10051859 0.81 ESR1 (0.43) ESR1ESR2PDK2MAPTLMNA
SCHEMBL25636436 0.81 ESR2 (0.43) ESR1ESR2PDK2MAPTLMNA
SCHEMBL27428804 0.81 ESR1 (0.50) ESR1ESR2PDK2MAPTTP53
SCHEMBL18100891 0.77 ESR1 (0.46) ESR1ESR2PDK2MAPTLMNA
SCHEMBL2883787 0.74 GABRA1 (0.49) ESR1ESR2PDK2MAPTLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20160280621-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PHOTOMASK, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE, COMPOUND, AND METHOD FOR PRODUCING COMPOUND FUJIFILM CORPORATION (JP) 2016-09-29 US disclosed
US-20160280621-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PHOTOMASK, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE, COMPOUND, AND METHOD FOR PRODUCING COMPOUND FUJIFILM CORPORATION (JP) 2016-09-29 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20160280621-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PHOTOMASK, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE, COMPOUND, AND METHOD FOR PRODUCING COMPOUND ARCN1, ACTR2, RER1 ESR1 244/4885ESR2 504/4885PDK2 4409/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.