SCHEMBL18110503

SCHEMBL18110503

O=C(N1CCOC(c2cccs2)C1)N1CCOC(c2cccs2)C1

nearest known ligand 0.43

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
BRD4 O60885 5/20 0.41
POLB P06746 1/20 0.40
ALDH1A1 P00352 3/20 0.40
BRDT Q58F21 1/20 0.39
NPSR1 Q6W5P4 1/20 0.38
SMN1; SMN2 Q16637 4/20 0.38
CYP3A4 P08684 1/20 0.38
MAPK1 P28482 1/20 0.38
NPC1 O15118 2/20 0.37
RAB9A P51151 2/20 0.37
MAPT P10636 1/20 0.37
KDM4E B2RXH2 1/20 0.37
TSHR P16473 1/20 0.37
HTT P42858 1/20 0.37
GAA P10253 1/20 0.36
MEN1 O00255 1/20 0.36
KMT2A Q03164 1/20 0.36
USP30 Q70CQ3 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30100985 0.90 BRD4 (0.40) BRD4POLBALDH1A1BRDTNPSR1
SCHEMBL30100978 0.82 USP2 (0.43) BRD4ALDH1A1BRDTSMN1; SMN2MAPT
SCHEMBL22653556 0.77 KDM4E (0.42) BRD4ALDH1A1SMN1; SMN2MAPTKDM4E
SCHEMBL18110505 0.77 SMN1; SMN2 (0.39) BRD4POLBALDH1A1SMN1; SMN2NPC1
SCHEMBL8664503 0.73 SMN1; SMN2 (0.49) ALDH1A1SMN1; SMN2NPC1RAB9AMAPT
SCHEMBL19690771 0.71
SCHEMBL8917481 0.71 DRD3 (0.54) KDM4ETSHRHTT
SCHEMBL30100998 0.70 CNR2 (0.53) POLBCYP3A4
SCHEMBL2133077 0.70 ALDH1A1 (0.52) POLBALDH1A1SMN1; SMN2NPC1RAB9A
SCHEMBL7017151 0.70 DRD3 (0.38) SMN1; SMN2MAPTKDM4ETSHRHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11679531-B2 Chemical mechanical polishing pad and preparation thereof ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. (US) 2023-06-20 US disclosed
US-20230112228-A1 CHEMICAL MECHANICAL POLISHING PAD AND PREPARATION THEREOF U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2023-04-13 US disclosed
US-20230112598-A1 CHEMICAL MECHANICAL POLISHING PAD AND PREPARATION THEREOF U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2023-04-13 US disclosed
EP-3277505-B1 POLYMERIC GRAVURE PRINTING FORM AND PROCESS FOR PREPARING THE SAME WITH CURABLE COMPOSITION HAVING A MULTIFUNCTIONAL URETHANE DUPONT ELECTRONICS INC (US) 2020-06-24 EP disclosed
US-10166754-B2 Polymeric gravure printing form and process for preparing the same with curable composition having a multifunctional urethane E I DU PONT DE NEMOURS AND COMPANY (US) 2019-01-01 US disclosed
US-20180178503-A1 POLYMERIC GRAVURE PRINTING FORM AND PROCESS FOR PREPARING THE SAME WITH CURABLE COMPOSITION HAVING A MULTIFUNCTIONAL URETHANE DUPONT ELECTRONICS, INC. 2018-06-28 US disclosed
US-9931830-B2 Polymeric gravure printing form and process for preparing the same with curable composition having a multifunctional urethane E I DU PONT DE NEMOURS AND COMPANY (US) 2018-04-03 US disclosed
EP-3277505-A1 POLYMERIC GRAVURE PRINTING FORM AND PROCESS FOR PREPARING THE SAME WITH CURABLE COMPOSITION HAVING A MULTIFUNCTIONAL URETHANE E. I. du Pont de Nemours and Company (US) 2018-02-07 EP disclosed
WO-2016160410-A1 POLYMERIC GRAVURE PRINTING FORM AND PROCESS FOR PREPARING THE SAME WITH CURABLE COMPOSITION HAVING A MULTIFUNCTIONAL URETHANE E I DU PONT DE NEMOURS AND COMPANY (US) 2016-10-06 WO disclosed
US-20160288479-A1 POLYMERIC PRINTING FORM AND PROCESS FOR PREPARING THE SAME WITH CURABLE COMPOSIITON HAVING A MULTIFUNCTIONAL URETHANE DUPONT ELECTRONICS, INC. 2016-10-06 US disclosed