SCHEMBL18120334

SCHEMBL18120334

C=Cc1ccc(OC(OC2CCCCC2)C2CCCCC2)cc1

nearest known ligand 0.34

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 2/20 0.34
▸ KDM4E B2RXH2 1/20 0.34
▸ HPGD P15428 2/20 0.33
▸ NPC1 O15118 1/20 0.33
▸ RAB9A P51151 1/20 0.33
▸ SMN1; SMN2 Q16637 1/20 0.33
▸ POLB P06746 1/20 0.31
▸ MAPT P10636 1/20 0.31
▸ IDO1 P14902 1/20 0.30
▸ ALDH1A3 P47895 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12159411 0.84 SMN1; SMN2 (0.37) ALDH1A1KDM4EHPGDNPC1RAB9A
SCHEMBL20411177 0.82 SMN1; SMN2 (0.39) ALDH1A1KDM4EHPGDNPC1RAB9A
SCHEMBL18120335 0.82 ALDH1A1 (0.35) ALDH1A1KDM4EHPGDNPC1RAB9A
SCHEMBL685735 0.81 ALDH1A1 (0.35) ALDH1A1KDM4EHPGDNPC1RAB9A
SCHEMBL18120330 0.80 CHRNB2 (0.35) ALDH1A1KDM4EHPGDNPC1RAB9A
SCHEMBL5900974 0.79 ALDH1A1 (0.35) ALDH1A1KDM4EHPGDNPC1RAB9A
SCHEMBL6689352 0.78 HPGD (0.35) ALDH1A1KDM4EHPGDNPC1RAB9A
SCHEMBL21235014 0.78 HPGD (0.35) ALDH1A1KDM4EHPGDNPC1RAB9A
SCHEMBL5900980 0.77 CHRNA7 (0.35) ALDH1A1KDM4EHPGDSMN1; SMN2POLB
SCHEMBL6694197 0.77 HPGD (0.34) ALDH1A1KDM4EHPGDPOLBMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10365560-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2019-07-30 — — US disclosed
US-9946157-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2018-04-17 — — US disclosed
US-9946157-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2018-04-17 — — US disclosed
US-9740097-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-08-22 — — US disclosed
US-9740097-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-08-22 — — US disclosed
US-20160291466-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-10-06 — — US disclosed
US-20160291465-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-10-06 — — US disclosed
US-20160291464-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-10-06 — — US disclosed
US-20160291466-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-10-06 — — US disclosed
US-20160291465-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-10-06 — — US disclosed
US-20160291464-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-10-06 — — US disclosed
US-20160291467-A1 RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-10-06 — — US disclosed
US-20160291467-A1 RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-10-06 — — US disclosed
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