SCHEMBL18120335

SCHEMBL18120335

C=Cc1ccc(OC(OC)C2CCCC2)cc1

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 2/20 0.35
▸ KDM4E B2RXH2 1/20 0.35
▸ ALDH1A3 P47895 1/20 0.35
▸ RAB9A P51151 3/20 0.35
▸ NPC1 O15118 2/20 0.35
▸ HPGD P15428 1/20 0.35
▸ SMN1; SMN2 Q16637 1/20 0.35
▸ SLC6A2 P23975 2/20 0.33
▸ SLC6A4 P31645 2/20 0.33
▸ SLC6A3 Q01959 2/20 0.33
▸ CHRNB2 P17787 1/20 0.33
▸ CHRNB4 P30926 1/20 0.33
▸ CHRNA3 P32297 1/20 0.33
▸ CHRNA7 P36544 1/20 0.33
▸ CHRNA4 P43681 1/20 0.33
▸ POLB P06746 1/20 0.32
▸ MAPT P10636 1/20 0.32
▸ KMT2A Q03164 2/20 0.31
▸ MEN1 O00255 1/20 0.31
▸ MITF O75030 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12159411 0.98 SMN1; SMN2 (0.37) ALDH1A1KDM4EALDH1A3RAB9ANPC1
SCHEMBL20411177 0.85 SMN1; SMN2 (0.39) ALDH1A1KDM4EALDH1A3RAB9ANPC1
SCHEMBL18120330 0.82 CHRNB2 (0.35) ALDH1A1KDM4EALDH1A3RAB9ANPC1
SCHEMBL18120334 0.82 ALDH1A1 (0.34) ALDH1A1KDM4EALDH1A3RAB9ANPC1
SCHEMBL2063751 0.76 SMN1; SMN2 (0.39) ALDH1A1KDM4EALDH1A3RAB9ANPC1
SCHEMBL28797072 0.75 CHRNB4 (0.42) ALDH1A1KDM4ESLC6A2SLC6A4SLC6A3
SCHEMBL18120332 0.74 PPARG (0.34) ALDH1A1KDM4ERAB9ANPC1HPGD
SCHEMBL18120331 0.74 PPARG (0.34) ALDH1A1KDM4ERAB9ANPC1HPGD
SCHEMBL18961214 0.73 ALDH1A1 (0.43) ALDH1A1KDM4ERAB9ANPC1HPGD
SCHEMBL685582 0.72 ALDH1A1 (0.46) ALDH1A1KDM4EALDH1A3RAB9ANPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9946157-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2018-04-17 — — US disclosed
US-9946157-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2018-04-17 — — US disclosed
US-9740097-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-08-22 — — US disclosed
US-9740097-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-08-22 — — US disclosed
US-20160291464-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-10-06 — — US disclosed
US-20160291466-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-10-06 — — US disclosed
US-20160291464-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-10-06 — — US disclosed
US-20160291466-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-10-06 — — US disclosed
US-20160291467-A1 RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-10-06 — — US disclosed
US-20160291467-A1 RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-10-06 — — US disclosed
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