SCHEMBL1815452

SCHEMBL1815452

CCCN(CCC)CCCCN(CCC)CCC

nearest known ligand 0.44

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
DNM1 Q05193 3/20 0.40
HRH3 Q9Y5N1 1/20 0.36
KDM5A P29375 1/20 0.35
DRD2 P14416 1/20 0.35
DRD4 P21917 1/20 0.35
DRD3 P35462 1/20 0.35
CA12 O43570 1/20 0.35
CA2 P00918 1/20 0.35
CA9 Q16790 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL759260 1.00 DNM1 (0.40) DNM1HRH3KDM5ADRD2DRD4
SCHEMBL757215 0.96 DNM1 (0.45) DNM1KDM5A
SCHEMBL31273671 0.96 DNM1 (0.45) DNM1KDM5A
SCHEMBL31273042 0.96 DNM1 (0.45) DNM1KDM5A
SCHEMBL757613 0.96 DNM1 (0.45) DNM1KDM5A
SCHEMBL516375 0.93 DNM1 (0.50) DNM1KDM5ACA12CA2CA9
SCHEMBL516239 0.93 DNM1 (0.50) DNM1KDM5ACA12CA2CA9
SCHEMBL755906 0.92 LCK (0.36) DNM1HRH3DRD2DRD4DRD3
SCHEMBL4180972 0.92 LCK (0.36) DNM1HRH3DRD2DRD4DRD3
SCHEMBL23921264 0.90 DNM1 (0.48) DNM1KDM5A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 55 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2605069-B1 RINSE LIQUID FOR LITHOGRAPHY AND METHOD FOR FORMING PATTERN USING SAME MERCK PATENT GMBH (DE) 2021-09-22 EP claimed
EP-3208659-A1 COMPOSITION FOR RESIST PATTERNING AND METHOD FOR FORMING PATTERN USING SAME AZ Electronic Materials (Luxembourg) S.à.r.l. (LU) 2017-08-23 EP claimed
US-20170219927-A1 COMPOSITION FOR RESIST PATTERNING AND METHOD FOR FORMING PATTERN USING SAME AZ ELECTRIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) 2017-08-03 US claimed
US-20130164694-A1 RINSE SOLUTION FOR LITHOGRAPHY AND PATTERN FORMATION METHOD EMPLOYING THE SAME AZ ELECTRONIC MATERIALS USA CORP. (US) 2013-06-27 US claimed
EP-2605069-A1 RINSE LIQUID FOR LITHOGRAPHY AND METHOD FOR FORMING PATTERN USING SAME AZ Electronic Materials USA Corp. (US) 2013-06-19 EP claimed
EP-4720172-A1 SIDE-CHAIN FUNCTIONALIZED POLYNORBORNENES AS IONOMERS AND AS MEMBRANE MATERIALS FOR ALKALINE ELECTROLYSIS OF WATER, AND FUEL CELL Forschungszentrum Jülich GmbH (DE) 2026-04-08 EP disclosed
WO-2025242796-A1 HYDROGENATED SIDE-CHAIN FUNCTIONALIZED POLYNORBORNENE-ANION EXCHANGE POLYMERS AS MEMBRANE MATERIALS FOR ALKALINE WATER ELECTROLYSIS AND FUEL CELLS Forschungszentrum Jülich GmbH (DE) 2025-11-27 WO disclosed
EP-3653584-B1 DRAW SOLUTION WITH SWITCHABLE SALT ADDITIVE AND METHOD FOR DESALINATING AN AQUEOUS SOLUTION WITH THIS DRAW SOLUTION UNIV KINGSTON (CA) 2025-08-06 EP disclosed
US-12372875-B2 Composition for resist pattern metallization process NISSAN CHEMICAL CORPORATION (JP) 2025-07-29 US disclosed
WO-2024245731-A1 SIDE-CHAIN FUNCTIONALIZED POLYNORBORNENES AS IONOMERS AND AS MEMBRANE MATERIALS FOR ALKALINE ELECTROLYSIS OF WATER, AND FUEL CELL Forschungszentrum Jülich GmbH (DE) 2024-12-05 WO disclosed
US-20240036469-A1 METHOD FOR MANUFACTURING THICKENED RESIST PATTERN, THICKENING SOLUTION, AND METHOD FOR MANUFACTURING PROCESSED SUBSTRATE MERCK ELECTRONICS LTD. (JP) 2024-02-01 US disclosed
US-11531269-B2 Method for producing resist pattern coating composition with use of solvent replacement method NISSAN CHEMICAL CORPORATION (JP) 2022-12-20 US disclosed
US-7973030-B2 Benzothiazepine and benzothiepine compounds ASAHI KASEI PHARMA CORPORATION (JP) 2011-07-05 US disclosed
WO-2011050469-A1 SWITCHABLE HYDROPHILICITY SOLVENTS AND METHODS OF USE THEREOF QUEEN'S UNIVERSITY AT KINGSTON (CA) 2011-05-05 WO disclosed
US-7803792-B2 Quaternary ammonium compounds ASAHI KASEI PHARMA CORPORATION (JP) 2010-09-28 US disclosed
US-7312208-B2 Quaternary ammonium compounds ASAHI KASEI PHARMA CORPORATION (JP) 2007-12-25 US disclosed
US-20070203115-A1 Novel quaternary ammonium compounds ASAHI KASEI PHARMA CORPORATION (JP) 2007-08-30 US disclosed
US-20070190041-A1 Novel benzothiazepine and bensothiepine compounds ASHAI KASEI PHARAMA CORPORATION (JP) 2007-08-16 US disclosed
US-5166029-A Toner and developer compositions with charge enhancing additives XEROX CORPORATION (US) 1992-11-24 US disclosed
US-4179469-A Preparation of amines UOP INC. (US) 1979-12-18 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20070203115-A1 Novel quaternary ammonium compounds SLC10A2, SLC10A1, ABCB11 DNM1 381/4885HRH3 2167/4885KDM5A 2878/4885
US-20070190041-A1 Novel benzothiazepine and bensothiepine compounds SLC10A1, GOT1, CES1 DNM1 712/4885HRH3 404/4885KDM5A 1431/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.