SCHEMBL18179342

SCHEMBL18179342

Cc1cccc2c1C1(CC(=O)c3ccccc31)CC2=O

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PGR P06401 2/20 0.39
NPSR1 Q6W5P4 3/20 0.37
LMNA P02545 3/20 0.37
CYP1A2 P05177 2/20 0.37
CYP3A4 P08684 2/20 0.37
CYP2C9 P11712 2/20 0.37
CYP2C19 P33261 2/20 0.37
L3MBTL1 Q9Y468 2/20 0.37
HTT P42858 1/20 0.37
DAO P14920 1/20 0.37
MEN1 O00255 3/20 0.36
KMT2A Q03164 3/20 0.36
CA1 P00915 1/20 0.36
CA2 P00918 1/20 0.36
CA7 P43166 1/20 0.36
CA9 Q16790 1/20 0.36
TYMS P04818 1/20 0.36
PDK2 Q15119 1/20 0.36
ACHE P22303 1/20 0.35
POLB P06746 3/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17427491 0.87 DAO (0.42) PGRLMNACYP2C19DAOMEN1
SCHEMBL23730282 0.82 CFTR (0.41) PGRNPSR1LMNACYP3A4HTT
SCHEMBL6262202 0.73 PGR (0.46) PGRCYP2C19DAOMEN1KMT2A
SCHEMBL31671044 0.72 PGR (0.42) PGRNPSR1LMNAMEN1KMT2A
SCHEMBL22755871 0.71 PDE7A (0.40) PGRPDK2ACHE
SCHEMBL29581434 0.71 PGR (0.51) PGRL3MBTL1MEN1KMT2ATYMS
SCHEMBL182096 0.71 PGR (0.51) PGRL3MBTL1MEN1KMT2ATYMS
SCHEMBL30897426 0.70 CFTR (0.36) PGRLMNACYP3A4MEN1KMT2A
SCHEMBL23729942 0.70 TSHR (0.41) CYP1A2CYP2C19MAPTTDP1
SCHEMBL17427493 0.70 CFTR (0.36) PGRLMNACYP3A4MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9958781-B2 Method for film formation, and pattern-forming method JSR CORPORATION (JP) 2018-05-01 US disclosed
US-9958781-B2 Method for film formation, and pattern-forming method JSR CORPORATION (JP) 2018-05-01 US disclosed
US-20180114698-A2 COMPOSITION FOR FILM FORMATION, FILM, PRODUCTION METHOD OF PATTERNED SUBSTRATE, AND COMPOUND JSR CORPORATION (JP) 2018-04-26 US disclosed
US-20180114698-A2 COMPOSITION FOR FILM FORMATION, FILM, PRODUCTION METHOD OF PATTERNED SUBSTRATE, AND COMPOUND JSR CORPORATION (JP) 2018-04-26 US disclosed
US-20170154782-A1 COMPOSITION FOR FILM FORMATION, FILM, PRODUCTION METHOD OF PATTERNED SUBSTRATE, AND COMPOUND JSR CORPORATION (JP) 2017-06-01 US disclosed
US-20170154782-A1 COMPOSITION FOR FILM FORMATION, FILM, PRODUCTION METHOD OF PATTERNED SUBSTRATE, AND COMPOUND JSR CORPORATION (JP) 2017-06-01 US disclosed
US-20160314984-A1 METHOD FOR FILM FORMATION, AND PATTERN-FORMING METHOD JSR CORPORATION (JP) 2016-10-27 US disclosed
US-20160314984-A1 METHOD FOR FILM FORMATION, AND PATTERN-FORMING METHOD JSR CORPORATION (JP) 2016-10-27 US disclosed