SCHEMBL18199010

SCHEMBL18199010

CCCC(CCC(F)(F)C(F)(F)F)OC(=O)C(C)(C)CC

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
CTSK P43235 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18199013 0.89 CTSK (0.33) CTSK
SCHEMBL14769063 0.85 CTSK (0.30) CTSK
SCHEMBL107639 0.85 CTSK (0.38) CTSK
SCHEMBL18198997 0.82
SCHEMBL18199027 0.80
SCHEMBL14769070 0.80 HMGCR (0.33) CTSK
SCHEMBL13024716 0.79
SCHEMBL12388858 0.79 CTSK (0.44) CTSK
SCHEMBL18199025 0.78 PRKCA (0.32)
SCHEMBL15908076 0.78 CTSK (0.40) CTSK

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230194986-A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-06-22 US disclosed
US-20160320699-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-11-03 US disclosed