Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18198997 | 0.90 | — | — | |
| SCHEMBL107639 | 0.89 | CTSK (0.38) | CTSKPRKCA | |
| SCHEMBL18199010 | 0.89 | CTSK (0.31) | CTSK | |
| SCHEMBL18199025 | 0.88 | PRKCA (0.32) | PRKCA | |
| SCHEMBL12388858 | 0.83 | CTSK (0.44) | CTSKPRKCA | |
| SCHEMBL15908076 | 0.81 | CTSK (0.40) | CTSK | |
| SCHEMBL25631164 | 0.81 | CA1 (0.33) | CTSK | |
| SCHEMBL18199027 | 0.81 | — | — | |
| SCHEMBL12935660 | 0.80 | ZDHHC7 (0.41) | CTSK | |
| SCHEMBL112106 | 0.79 | CTSK (0.36) | CTSKPRKCA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230194986-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-06-22 | — | — | US | disclosed |
| US-20160320699-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-11-03 | — | — | US | disclosed |