Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CTSS | P25774 | 12/20 | 0.45 |
| ▸ | FAAH | O00519 | 3/20 | 0.43 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.38 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.38 |
| ▸ | XDH | P47989 | 1/20 | 0.37 |
| ▸ | ENPP3 | O14638 | 1/20 | 0.37 |
| ▸ | ENPP1 | P22413 | 1/20 | 0.37 |
| ▸ | LMNA | P02545 | 1/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16745522 | 0.81 | CTSS (0.45) | CTSSFAAHCYP3A4CYP2C9XDH | |
| SCHEMBL17736504 | 0.66 | FAAH (0.40) | CTSSFAAHXDHSMN1; SMN2 | |
| SCHEMBL17341902 | 0.65 | FAAH (0.44) | CTSSFAAHXDHLMNASMN1; SMN2 | |
| SCHEMBL22367792 | 0.65 | FAAH (0.50) | FAAHCYP2C9XDHLMNASMN1; SMN2 | |
| SCHEMBL1590095 | 0.64 | FAAH (0.55) | FAAHCYP2C9XDHSMN1; SMN2 | |
| SCHEMBL17951858 | 0.64 | FAAH (0.54) | FAAHXDH | |
| SCHEMBL7685083 | 0.63 | ELANE (0.56) | LMNASMN1; SMN2 | |
| SCHEMBL6733860 | 0.63 | ELANE (0.56) | LMNASMN1; SMN2 | |
| Hydrochloric Acid SCHEMBL23320558 | 0.63 | FAAH (0.54) | FAAHCYP2C9XDHSMN1; SMN2 | |
| SCHEMBL3612583 | 0.63 | FAAH (0.54) | FAAHCYP2C9XDHSMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9599901-B2 | Photosensitive resin composition, cured product and method for producing same, method for producing resin pattern, cured film, liquid crystal display device, organic el display device, infrared cut filter, and solid-state imaging device | FUJIFILM CORPORATION (JP) | 2017-03-21 | — | — | US | disclosed |
| US-9599901-B2 | Photosensitive resin composition, cured product and method for producing same, method for producing resin pattern, cured film, liquid crystal display device, organic el display device, infrared cut filter, and solid-state imaging device | FUJIFILM CORPORATION (JP) | 2017-03-21 | — | — | US | disclosed |
| US-20160327865-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT AND METHOD FOR PRODUCING SAME, METHOD FOR PRODUCING RESIN PATTERN, CURED FILM, LIQUID CRYSTAL DISPLAY DEVICE, ORGANIC EL DISPLAY DEVICE, INFRARED CUT FILTER, AND SOLID-STATE IMAGING DEVICE | FUJIFILM CORPORATION (JP) | 2016-11-10 | — | — | US | disclosed |
| US-20160327865-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT AND METHOD FOR PRODUCING SAME, METHOD FOR PRODUCING RESIN PATTERN, CURED FILM, LIQUID CRYSTAL DISPLAY DEVICE, ORGANIC EL DISPLAY DEVICE, INFRARED CUT FILTER, AND SOLID-STATE IMAGING DEVICE | FUJIFILM CORPORATION (JP) | 2016-11-10 | — | — | US | disclosed |