Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FAAH | O00519 | 2/20 | 0.40 |
| ▸ | CTSS | P25774 | 2/20 | 0.39 |
| ▸ | XDH | P47989 | 8/20 | 0.36 |
| ▸ | NLRP3 | Q96P20 | 2/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | RBP4 | P02753 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.34 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.34 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.34 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17736498 | 0.88 | FAAH (0.39) | FAAHCTSSXDHNLRP3RBP4 | |
| SCHEMBL16381780 | 0.85 | XDH (0.50) | FAAHXDHNLRP3SMN1; SMN2 | |
| SCHEMBL16745522 | 0.80 | CTSS (0.45) | FAAHCTSSXDHNLRP3 | |
| SCHEMBL17736515 | 0.77 | HDAC4 (0.31) | KMT2AMEN1 | |
| SCHEMBL16745520 | 0.76 | XDH (0.49) | FAAHCTSSXDHNLRP3SMN1; SMN2 | |
| SCHEMBL16381776 | 0.76 | XDH (0.47) | XDHNLRP3SMN1; SMN2 | |
| SCHEMBL16745523 | 0.75 | XDH (0.39) | XDHNLRP3KMT2AMEN1ALDH1A1 | |
| SCHEMBL17341908 | 0.74 | NPC1 (0.48) | FAAHXDHNLRP3KMT2AMEN1 | |
| SCHEMBL17736500 | 0.74 | XDH (0.39) | FAAHXDHNLRP3 | |
| SCHEMBL16745529 | 0.74 | GAA (0.41) | XDHNLRP3KMT2AMEN1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20160131976-A1 | RESIST COMPOSITION FOR SEMICONDUCTOR MANUFACTURING PROCESS; RESIST FILM, RESIST-COATED MASK BLANKS, PHOTOMASK, AND RESIST PATTERNING METHOD USING SAID RESIST COMPOSITION; ELECTRONIC-DEVICE MANUFACTURING METHOD; AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-05-12 | — | — | US | disclosed |
| US-20160131976-A1 | RESIST COMPOSITION FOR SEMICONDUCTOR MANUFACTURING PROCESS; RESIST FILM, RESIST-COATED MASK BLANKS, PHOTOMASK, AND RESIST PATTERNING METHOD USING SAID RESIST COMPOSITION; ELECTRONIC-DEVICE MANUFACTURING METHOD; AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-05-12 | — | — | US | disclosed |