SCHEMBL18213652

SCHEMBL18213652

CN(C)c1ccc2c(c1)Oc1cc(N(C)C)ccc1C2c1ccccc1CO

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 5/20 0.49
NPSR1 Q6W5P4 5/20 0.49
MAPT P10636 4/20 0.49
SMN1; SMN2 Q16637 3/20 0.49
TDP1 Q9NUW8 2/20 0.49
NPC1 O15118 1/20 0.49
L3MBTL1 Q9Y468 1/20 0.49
MEN1 O00255 4/20 0.40
KMT2A Q03164 4/20 0.40
HTT P42858 3/20 0.40
TSHR P16473 3/20 0.40
TP53 P04637 2/20 0.40
GAA P10253 2/20 0.40
ALOX15 P16050 2/20 0.40
MAPK1 P28482 2/20 0.40
USP2 O75604 2/20 0.40
CASP1 P29466 1/20 0.40
CASP7 P55210 1/20 0.40
ALDH1A1 P00352 2/20 0.39
TUBB4A P04350 2/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18213657 0.87 NPSR1 (0.47) LMNANPSR1MAPTSMN1; SMN2TDP1
SCHEMBL18179775 0.86 MEN1 (0.43) LMNANPSR1MAPTSMN1; SMN2TDP1
SCHEMBL18606132 0.81 ALDH1A1 (0.43) LMNANPSR1MAPTSMN1; SMN2TDP1
SCHEMBL18213646 0.80 MEN1 (0.43) LMNAMAPTSMN1; SMN2NPC1MEN1
SCHEMBL3896874 0.78 LMNA (0.46) LMNANPSR1MAPTSMN1; SMN2TDP1
SCHEMBL28608473 0.77 CYP2C9 (0.64) LMNANPSR1MAPTSMN1; SMN2TDP1
SCHEMBL9626207 0.76 NPSR1 (0.51) LMNANPSR1MAPTSMN1; SMN2TDP1
SCHEMBL18213656 0.76 NPSR1 (0.41) LMNANPSR1MAPTSMN1; SMN2TDP1
SCHEMBL18623952 0.75 ALDH1A1 (0.37) LMNANPSR1MAPTSMN1; SMN2TDP1
SCHEMBL18213653 0.74 MAPT (0.44) LMNANPSR1MAPTTDP1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9939568-B2 Photosensitive resin composition for color filter and application of the same CHI MEI CORPORATION (TW) 2018-04-10 US disclosed
US-9939568-B2 Photosensitive resin composition for color filter and application of the same CHI MEI CORPORATION (TW) 2018-04-10 US disclosed
US-20160327863-A1 PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER AND APPLICATION OF THE SAME CHI MEI CORPORATION (TW) 2016-11-10 US disclosed
US-20160327863-A1 PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER AND APPLICATION OF THE SAME CHI MEI CORPORATION (TW) 2016-11-10 US disclosed