SCHEMBL18218319

SCHEMBL18218319

CC(C)(C)CC(C)(C)c1cc(C=O)c(O)c(CO)c1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CYP3A4 P08684 5/20 0.41
▸ HIF1A Q16665 2/20 0.41
▸ ALDH1A1 P00352 2/20 0.41
▸ HSD17B10 Q99714 2/20 0.41
▸ IDH1 O75874 1/20 0.41
▸ CYP2C9 P11712 1/20 0.41
▸ ALOX15 P16050 1/20 0.41
▸ SHBG P04278 1/20 0.39
▸ CYP2D6 P10635 1/20 0.38
▸ ERN1 O75460 7/20 0.37
▸ KLF10 Q13118 1/20 0.36
▸ LMNA P02545 3/20 0.36
▸ MEN1 O00255 2/20 0.36
▸ KMT2A Q03164 2/20 0.36
▸ KDM4E B2RXH2 1/20 0.36
▸ HPGD P15428 1/20 0.36
▸ AOX1 Q06278 1/20 0.36
▸ TRIM24 O15164 1/20 0.35
▸ TRIM33 Q9UPN9 1/20 0.35
▸ SMN1; SMN2 Q16637 2/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18218315 0.84 CYP2C19 (0.43) HIF1AALDH1A1HSD17B10CYP2C9CYP2D6
SCHEMBL5709987 0.84 IDH1 (0.53) CYP3A4HIF1AALDH1A1HSD17B10IDH1
SCHEMBL18218326 0.83 ALOX15 (0.46) CYP3A4HIF1AALDH1A1HSD17B10ALOX15
SCHEMBL18218332 0.81 ERN1 (0.43) ALDH1A1ALOX15ERN1KLF10LMNA
SCHEMBL5674122 0.81 SHBG (0.41) CYP3A4HIF1AALDH1A1HSD17B10IDH1
SCHEMBL9483561 0.80 ALDH1A1 (0.41) CYP3A4HIF1AALDH1A1HSD17B10IDH1
SCHEMBL18218335 0.80 ALOX15 (0.46) CYP3A4HIF1AALDH1A1HSD17B10ALOX15
SCHEMBL7914494 0.76 CYP3A4 (0.46) CYP3A4HIF1AALDH1A1HSD17B10IDH1
SCHEMBL31217717 0.76 CYP3A4 (0.46) CYP3A4HIF1AALDH1A1HSD17B10IDH1
SCHEMBL10130845 0.74 CYP3A4 (0.42) CYP3A4HIF1AALDH1A1HSD17B10IDH1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11720024-B2 Resist underlayer film-forming composition containing indolocarbazole novolak resin NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2023-08-08 — — US disclosed
US-20160326396-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING NOVOLAC POLYMER HAVING SECONDARY AMINO GROUP NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-11-10 — — US disclosed
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