SCHEMBL18218335

SCHEMBL18218335

CC(C)(c1cc(C=O)c(O)c(C=O)c1)c1cc(CO)c(O)c(CO)c1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALOX15 P16050 2/20 0.46
▸ KLF10 Q13118 1/20 0.46
▸ MAPK1 P28482 1/20 0.46
▸ HTT P42858 1/20 0.46
▸ ERN1 O75460 10/20 0.44
▸ ALDH1A1 P00352 2/20 0.36
▸ HPGD P15428 2/20 0.36
▸ CYP3A4 P08684 1/20 0.36
▸ TSHR P16473 1/20 0.36
▸ ALOX12 P18054 1/20 0.36
▸ CASP1 P29466 1/20 0.36
▸ RECQL P46063 1/20 0.36
▸ HIF1A Q16665 1/20 0.36
▸ HSD17B10 Q99714 1/20 0.36
▸ TDP1 Q9NUW8 1/20 0.36
▸ GPR35 Q9HC97 1/20 0.35
▸ CYP2C19 P33261 1/20 0.35
▸ KDM4E B2RXH2 2/20 0.35
▸ MEN1 O00255 1/20 0.35
▸ LMNA P02545 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18218326 0.97 ALOX15 (0.46) ALOX15KLF10MAPK1HTTERN1
SCHEMBL18218332 0.89 ERN1 (0.43) ALOX15KLF10MAPK1HTTERN1
SCHEMBL9176114 0.86 ERN1 (0.58) ALOX15MAPK1HTTERN1ALDH1A1
SCHEMBL18218323 0.85 KLF10 (0.46) ALOX15KLF10MAPK1HTTERN1
SCHEMBL18218315 0.85 CYP2C19 (0.43) KLF10ERN1ALDH1A1HPGDTSHR
SCHEMBL224429 0.84 ALOX15 (0.61) ALOX15KLF10MAPK1HTTALDH1A1
SCHEMBL26134510 0.84 ALOX15 (0.61) ALOX15KLF10MAPK1HTTALDH1A1
SCHEMBL14028985 0.82 ALOX15 (0.59) ALOX15KLF10MAPK1HTTALDH1A1
SCHEMBL12285444 0.80 ALOX15 (0.53) ALOX15KLF10MAPK1HTTALDH1A1
SCHEMBL18218319 0.80 CYP3A4 (0.41) ALOX15KLF10MAPK1ERN1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11720024-B2 Resist underlayer film-forming composition containing indolocarbazole novolak resin NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2023-08-08 — — US disclosed
US-20160326396-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING NOVOLAC POLYMER HAVING SECONDARY AMINO GROUP NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-11-10 — — US disclosed
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