Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 1/20 | 0.42 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.39 |
| ▸ | MEN1 | O00255 | 2/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.39 |
| ▸ | TGM2 | P21980 | 2/20 | 0.38 |
| ▸ | MTNR1A | P48039 | 1/20 | 0.38 |
| ▸ | MTNR1B | P49286 | 1/20 | 0.38 |
| ▸ | PPARG | P37231 | 6/20 | 0.37 |
| ▸ | PPARA | Q07869 | 6/20 | 0.37 |
| ▸ | AKT1 | P31749 | 1/20 | 0.37 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | EGFR | P00533 | 1/20 | 0.35 |
| ▸ | TP53 | P04637 | 1/20 | 0.35 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.35 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | PKM | P14618 | 1/20 | 0.35 |
| ▸ | HPGD | P15428 | 1/20 | 0.35 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL242390 | 0.85 | LMNA (0.43) | MTNR1AMTNR1BPPARGPPARAALOX15 | |
| SCHEMBL19309368 | 0.85 | LMNA (0.43) | MTNR1AMTNR1BPPARGPPARAALOX15 | |
| Acrylic Acid SCHEMBL1618262 | 0.84 | KDM4E (0.46) | KDM4EMEN1KMT2ASMN1; SMN2ALDH1A1 | |
| Acrylic Acid SCHEMBL29368977 | 0.84 | THRB (0.44) | THRBKDM4EMEN1KMT2ASMN1; SMN2 | |
| Acrylic Acid SCHEMBL181510 | 0.83 | THRB (0.41) | THRBKDM4EMEN1KMT2ASMN1; SMN2 | |
| Acrylic Acid SCHEMBL27040911 | 0.82 | THRB (0.43) | THRBKDM4EMEN1KMT2ASMN1; SMN2 | |
| Acrylic Acid SCHEMBL28388801 | 0.82 | THRB (0.37) | THRBKDM4EMEN1KMT2ASMN1; SMN2 | |
| Di(Hydroxyethyl)Ether SCHEMBL1378128 | 0.82 | THRB (0.40) | THRBKDM4EMEN1KMT2ASMN1; SMN2 | |
| Di(Hydroxyethyl)Ether SCHEMBL1374897 | 0.82 | THRB (0.40) | THRBKDM4EMEN1KMT2ASMN1; SMN2 | |
| Methacrylic Acid SCHEMBL737600 | 0.81 | MTNR1A (0.44) | MTNR1AMTNR1BPPARGPPARAALOX15 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 227 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-120137111-A | Composition for 3D ink-jet printing and preparation method and application thereof | 珠海赛纳三维科技有限公司 | 2025-06-13 | — | — | CN | claimed |
| CN-117986426-A | Preparation method of emulsifier for waterproof emulsion | 南通腾龙化工科技有限公司 | 2024-05-07 | — | — | CN | claimed |
| CN-116606615-A | Lithium ion battery negative electrode water-based adhesive and preparation method thereof | 常棣科技(深圳)有限公司 | 2023-08-18 | — | — | CN | claimed |
| US-20110159285-A1 | PHOTOPOLYMERIZED RESIN COMPOSITION AND OPTICAL FIBER MANUFACTURED WITH SAME | SSCP CO., LTD. (KR) | 2011-06-30 | — | — | US | claimed |
| US-20110135269-A1 | PHOTOCURABLE COATING COMPOSITION | SSCP CO., LTD. (KR) | 2011-06-09 | — | — | US | claimed |
| EP-2322576-A2 | PHOTOPOLYMERIZED RESIN COMPOSITION AND OPTICAL FIBER MANUFACTURED WITH SAME | SSCP Co., Ltd. (KR) | 2011-05-18 | — | — | EP | claimed |
| EP-2316896-A2 | PHOTOCURABLE COATING COMPOSITION | SSCP Co., Ltd. (KR) | 2011-05-04 | — | — | EP | claimed |
| JP-7109323-A | — | — | None | — | — | JP | disclosed |
| EP-3471831-B1 | ONE PART ACRYLIC NAIL FORMULATION | MYCONE DENTAL SUPPLY CO INC (US) | 2026-01-07 | — | — | EP | disclosed |
| EP-4053183-B1 | SILICONE POLYURETHANE, STRETCHABLE FILM, AND METHOD FOR FORMING THE STRETCHABLE FILM | SHINETSU CHEMICAL CO (JP) | 2025-12-10 | — | — | EP | disclosed |
| US-20250210448-A1 | DIE ATTACH FILM AND SEMICONDUCTOR PACKAGE INCLUDING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2025-06-26 | — | — | US | disclosed |
| CN-120192721-A | Die attach film and semiconductor package including the same | 三星电子株式会社 | 2025-06-24 | — | — | CN | disclosed |
| CN-120137111-A | Composition for 3D ink-jet printing and preparation method and application thereof | 珠海赛纳三维科技有限公司 | 2025-06-13 | — | — | CN | disclosed |
| EP-1116964-A2 | UV-curable fresnel lens resin composition, fresnel lens, and back projection screen | SANYO CHEMICAL INDUSTRIES, LTD. (JP) | 2001-07-18 | — | — | EP | disclosed |
| EP-1083274-A1 | METHOD FOR REPAIRING AND REINFORCING EXISTING CONCRETE STRUCTURE AND RESIN | Mitsubishi Rayon Co., Ltd. (JP) | 2001-03-14 | — | — | EP | disclosed |
| US-5903399-A | A CURIED LENS COMPRISING ADDITION-CONDENSATION COPOLYMER WITH METHYL METHACRYLATE MONOMER, PROVIDING HIGH REFRACTIVE INDEX, SCRATCH RESISTANCE, ADHESION TO SHEET, ANTISTATIC PROPERTIES | SANYO CHEMICAL INDUSTRIES, LTD. (JP) | 1999-05-11 | — | — | US | disclosed |
| US-5805358-A | BASED ON A METHYL METHACRYLATE POLYMER OR COPOLYMER | SANYO CHEMICAL INDUSTRIES, LTD. (JP) | 1998-09-08 | — | — | US | disclosed |
| US-5684913-A | REFRACTIVE INDEX | BRIDGESTONE CORPORATION (JP) | 1997-11-04 | — | — | US | disclosed |
| EP-0757261-A2 | UV-curable fresnel lens resin composition, fresnel lens, and back projection screen | SANYO CHEMICAL INDUSTRIES, LTD. (JP) | 1997-02-05 | — | — | EP | disclosed |
| JP-H07109323-A | POLYMER AND DISPERSANT FOR COAL-WATER SLURRY | NIPPON KAYAKU CO LTD | 1995-04-25 | — | — | JP | disclosed |