⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL105367 | 0.74 | — | — | |
| SCHEMBL7638371 | 0.72 | — | — | |
| SCHEMBL4713842 | 0.72 | — | — | |
| SCHEMBL1823639 | 0.70 | — | — | |
| SCHEMBL715641 | 0.67 | THRB (0.33) | — | |
| SCHEMBL702848 | 0.67 | — | — | |
| SCHEMBL9650 | 0.67 | — | — | |
| SCHEMBL716235 | 0.64 | THRB (0.38) | — | |
| SCHEMBL714644 | 0.64 | THRB (0.38) | — | |
| SCHEMBL12485754 | 0.64 | THRB (0.38) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-56076417-A | — | — | None | — | — | JP | disclosed |
| JP-1033147-A | — | — | None | — | — | JP | disclosed |
| EP-1818723-B1 | COMPOSITION FOR FORMING ANTIREFLECTION FILM, LAYERED PRODUCT, AND METHOD OF FORMING RESIST PATTERN | JSR CORP (JP) | 2011-05-04 | — | — | EP | disclosed |
| US-7709182-B2 | Composition for forming antireflection film, layered product, and method of forming resist pattern | JSR CORPORATION (JP) | 2010-05-04 | — | — | US | disclosed |
| EP-1263702-B1 | TREATMENT OF FLUOROCARBON FEEDSTOCKS | SOUTH AFRICAN NUCLEAR ENERGY (ZA) | 2009-08-26 | — | — | EP | disclosed |
| US-20080124524-A1 | Composition For Forming Antireflection Film, Layered Product, And Method Of Forming Resist Pattern | JSR CORPORATION (JP) | 2008-05-29 | — | — | US | disclosed |
| US-7282525-B2 | Pellicle, producing method thereof and adhesive | MITSUI CHEMICALS, INC. (JP) | 2007-10-16 | — | — | US | disclosed |
| EP-1818723-A1 | COMPOSITION FOR FORMING ANTIREFLECTION FILM, LAYERED PRODUCT, AND METHOD OF FORMING RESIST PATTERN | JSR Corporation (JP) | 2007-08-15 | — | — | EP | disclosed |
| US-7252744-B2 | Treatment of fluorocarbon feedstocks | SOUTH AFRICAN NUCLEAR ENERGY CORPORATION LIMITED (ZA) | 2007-08-07 | — | — | US | disclosed |
| US-20030114600-A1 | Treatment of fluorocarbon feedstocks | 3M INNOVATIVE PROPERTIES COMPANY | 2003-06-19 | — | — | US | disclosed |
| EP-0304487-B1 | POLYMERIC BLENDS | RAYCHEM CORPORATION (US) | 1993-05-19 | — | — | EP | disclosed |
| EP-0524700-A1 | Polymeric blends | RAYCHEM CORPORATION (US) | 1993-01-27 | — | — | EP | disclosed |
| US-5109071-A | Hexafluoropropylene-vinylidene fluoride copolymer and a fluoroelastomer | RAYCHEM CORPORATION (US) | 1992-04-28 | — | — | US | disclosed |
| EP-0161581-B1 | USE OF IRRADIATION-HARDENABLE LACQUERS FOR THE MANUFACTURE OF COATINGS | BAYER AG (DE) | 1990-08-22 | — | — | EP | disclosed |
| US-4935467-A | ETHYLENE-TETRAFLUOROETHYLENE COPOLYMER OR VINYLIDENE FLUORIDE COPOLYMER AND A THERMOPLASTIC ELASTOMER | RAYCHEM CORPORATION (US) | 1990-06-19 | — | — | US | disclosed |
| EP-0304487-A1 | POLYMERIC BLENDS. | RAYCHEM CORP (US) | 1989-03-01 | — | — | EP | disclosed |
| WO-1988007063-A1 | POLYMERIC BLENDS | RAYCHEM CORPORATION (US) | 1988-09-22 | — | — | WO | disclosed |
| EP-0161581-A2 | Use of irradiation-hardenable lacquers for the manufacture of coatings | BAYER AG (DE) | 1985-11-21 | — | — | EP | disclosed |
| JP-S5676417-A | DRUMHEAD | KUREHA CHEM IND CO LTD | 1981-06-24 | — | — | JP | disclosed |
| US-4251399-A | AN ELASTOMER, AND AN ORGANIC PEROXIDE | DAIKIN KOGYO CO., LTD. (JP) | 1981-02-17 | — | — | US | disclosed |