SCHEMBL18311526

SCHEMBL18311526

CCO[Si](CCCNS(=O)(=O)c1ccc(OC)cc1)(OCC)OCC

nearest known ligand 0.68

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 10/20 0.68
PKM P14618 1/20 0.68
USP2 O75604 1/20 0.60
SMN1; SMN2 Q16637 2/20 0.56
MEN1 O00255 2/20 0.54
KMT2A Q03164 2/20 0.54
POLB P06746 1/20 0.52
HTR7 P34969 1/20 0.50
LMNA P02545 1/20 0.50
HTT P42858 1/20 0.50
CYP19A1 P11511 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14150232 0.85 ALDH1A1 (0.58) ALDH1A1PKMSMN1; SMN2LMNA
SCHEMBL7185182 0.81 ALDH1A1 (0.84) ALDH1A1PKMUSP2SMN1; SMN2MEN1
SCHEMBL1465523 0.80 ALDH1A1 (0.87) ALDH1A1PKMUSP2SMN1; SMN2MEN1
SCHEMBL2616742 0.80 POLB (0.64) ALDH1A1USP2SMN1; SMN2MEN1KMT2A
SCHEMBL15806062 0.79 MMP13 (0.59) ALDH1A1PKMMEN1KMT2APOLB
SCHEMBL5563528 0.79 ALDH1A1 (0.86) ALDH1A1PKMUSP2SMN1; SMN2MEN1
SCHEMBL29163150 0.79 ALDH1A1 (0.84) ALDH1A1PKMUSP2SMN1; SMN2MEN1
SCHEMBL9149721 0.79 ALDH1A1 (0.84) ALDH1A1PKMUSP2SMN1; SMN2MEN1
SCHEMBL29183292 0.79 ALDH1A1 (0.84) ALDH1A1PKMUSP2SMN1; SMN2MEN1
SCHEMBL29183282 0.79 ALDH1A1 (0.84) ALDH1A1PKMUSP2SMN1; SMN2MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240377745-A1 SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION AND SILICON-CONTAINING RESIST UNDERLAYER FILM NISSAN CHEMICAL CORPORATION (JP) 2024-11-14 US disclosed
CN-107615168-B Radiation-sensitive composition 日产化学工业株式会社 2023-12-19 CN disclosed
CN-117008420-A Radiation-sensitive composition 日产化学工业株式会社 2023-11-07 CN disclosed
US-11561472-B2 Radiation sensitive composition NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2023-01-24 US disclosed
US-11175583-B2 Silicon-containing resist underlayer film-forming composition having phenyl group-containing chromophore NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2021-11-16 US disclosed
EP-3309614-B1 RADIATION SENSITIVE COMPOSITION NISSAN CHEMICAL CORP (JP) 2021-11-10 EP disclosed
US-10845703-B2 Film-forming composition containing silicone having crosslinking reactivity NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2020-11-24 US disclosed
CN-107075302-B Film-forming composition containing crosslinking reactive silicon 日产化学工业株式会社 2020-08-04 CN disclosed
CN-106462075-B Composition for forming resist underlayer film containing silicon having phenyl chromophore 日产化学工业株式会社 2019-12-06 CN disclosed
US-10197917-B2 Silicon-containing resists underlayer film-forming composition having phenyl group-containing chromophore NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2019-02-05 US disclosed
US-20180335698-A1 FILM-FORMING COMPOSITION CONTAINING SILICONE HAVING CROSSLINKING REACTIVITY NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2018-11-22 US disclosed
US-20180181000-A1 RADIATION SENSITIVE COMPOSITION NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2018-06-28 US disclosed
EP-3309614-A1 RADIATION SENSITIVE COMPOSITION Nissan Chemical Industries, Ltd. (JP) 2018-04-18 EP disclosed
EP-3222688-A1 FILM-FORMING COMPOSITION CONTAINING CROSSLINKABLE REACTIVE SILICONE Nissan Chemical Industries, Ltd. (JP) 2017-09-27 EP disclosed
US-20170146906-A1 SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION HAVING PHENYL GROUP-CONTAINING CHROMOPHORE NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-05-25 US disclosed
WO-2016199762-A1 RADIATION SENSITIVE COMPOSITION 日産化学工業株式会社 2016-12-15 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11561472-B2 Radiation sensitive composition RER1, RAD1, RAD51 ALDH1A1 2201/4885PKM 1701/4885USP2 2841/4885
US-20180181000-A1 RADIATION SENSITIVE COMPOSITION RER1, RAD1, RAD51 ALDH1A1 1670/4885PKM 2131/4885USP2 2987/4885
US-10845703-B2 Film-forming composition containing silicone having crosslinking reactivity SETDB1, KDM2B, SRSF9 ALDH1A1 1744/4885PKM 3492/4885USP2 2197/4885
US-20180335698-A1 FILM-FORMING COMPOSITION CONTAINING SILICONE HAVING CROSSLINKING REACTIVITY SETDB1, KDM2B, CD79B ALDH1A1 1860/4885PKM 3675/4885USP2 2471/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.