SCHEMBL18355102

SCHEMBL18355102

C=Cc1ccc2cc(C(=O)OC3c4ccccc4C(=O)c4ccccc43)ccc2c1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 3/20 0.38
SMN1; SMN2 Q16637 3/20 0.38
ALDH1A1 P00352 2/20 0.38
CYP3A4 P08684 2/20 0.38
KDM4E B2RXH2 1/20 0.38
MEN1 O00255 1/20 0.38
EGFR P00533 1/20 0.38
TP53 P04637 1/20 0.38
PKM P14618 1/20 0.38
HPGD P15428 1/20 0.38
ALOX15 P16050 1/20 0.38
ALOX12 P18054 1/20 0.38
JAK1 P23458 1/20 0.38
MAPK1 P28482 1/20 0.38
KMT2A Q03164 1/20 0.38
HSD17B10 Q99714 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
EDNRB P24530 3/20 0.35
EDNRA P25101 3/20 0.35
NPC1 O15118 2/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9891412 0.94 CYP3A4 (0.40) MAPTSMN1; SMN2ALDH1A1CYP3A4KDM4E
SCHEMBL18355103 0.87 EDNRB (0.40) MAPTSMN1; SMN2ALDH1A1TDP1EDNRB
SCHEMBL9610448 0.86 SMN1; SMN2 (0.37) MAPTSMN1; SMN2ALDH1A1CYP3A4KDM4E
SCHEMBL2776767 0.80 TAS1R3 (0.41) ALDH1A1KDM4EMEN1PKMKMT2A
SCHEMBL9610529 0.75 MAPT (0.35) MAPTSMN1; SMN2ALDH1A1CYP3A4KDM4E
SCHEMBL19719109 0.75
SCHEMBL17995089 0.75 MEN1 (0.33) MAPTKDM4EMEN1KMT2ALMNA
SCHEMBL9610453 0.74 TAS1R3 (0.36) MAPTSMN1; SMN2ALDH1A1CYP3A4KDM4E
SCHEMBL9610358 0.73 TAS1R3 (0.36) MAPTSMN1; SMN2ALDH1A1CYP3A4KDM4E
SCHEMBL10053097 0.72 PTPN1 (0.33) MAPTSMN1; SMN2ALDH1A1CYP3A4KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9846360-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-12-19 US disclosed
US-9846360-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-12-19 US disclosed
US-20170003590-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-01-05 US disclosed
US-20170003590-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-01-05 US disclosed