SCHEMBL18355103

SCHEMBL18355103

C=Cc1ccc(C(=O)OC2c3ccccc3C(=O)c3ccccc32)cc1

nearest known ligand 0.40

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
EDNRB P24530 3/20 0.40
EDNRA P25101 3/20 0.40
TAS1R3 Q7RTX0 1/20 0.39
TAS1R1 Q7RTX1 1/20 0.39
TTR P02766 1/20 0.34
POLB P06746 1/20 0.34
TDP1 Q9NUW8 1/20 0.33
PTPN1 P18031 2/20 0.33
ALDH1A1 P00352 2/20 0.33
NPC1 O15118 1/20 0.33
LMNA P02545 1/20 0.33
MAPT P10636 1/20 0.33
RAB9A P51151 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
PTPRC P08575 1/20 0.33
PTPRF P10586 1/20 0.33
CDC25B P30305 1/20 0.33
S100A4 P26447 1/20 0.33
TSHR P16473 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2776767 0.93 TAS1R3 (0.41) TAS1R3TAS1R1POLBALDH1A1LMNA
SCHEMBL18355102 0.87 MAPT (0.38) EDNRBEDNRATAS1R3TAS1R1TTR
SCHEMBL9610453 0.83 TAS1R3 (0.36) TAS1R3TAS1R1POLBTDP1ALDH1A1
SCHEMBL9610480 0.82 TAS1R3 (0.46) TAS1R3TAS1R1PTPN1MAPTPTPRF
SCHEMBL9891412 0.80 CYP3A4 (0.40) TAS1R3TAS1R1POLBTDP1PTPN1
SCHEMBL18354442 0.75 EDNRB (0.35) EDNRBEDNRAPOLBTDP1ALDH1A1
SCHEMBL21778844 0.74 F2 (0.50) POLBTDP1ALDH1A1LMNAMAPT
SCHEMBL9610525 0.74 EDNRB (0.35) EDNRBEDNRATDP1ALDH1A1NPC1
SCHEMBL21758200 0.73 LMNA (0.46) POLBTDP1ALDH1A1LMNAMAPT
Anthraquinone SCHEMBL27844946 0.73 TTR (0.58) TTRPOLBTDP1ALDH1A1NPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9846360-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-12-19 US disclosed
US-9846360-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-12-19 US disclosed
US-20170003590-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-01-05 US disclosed
US-20170003590-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-01-05 US disclosed