SCHEMBL18372575

SCHEMBL18372575

CC1(Oc2ccc(C(O)c3ccc(OC4(C)CCCCC4)cc3)cc2)CCCCC1

nearest known ligand 0.39

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ELANE P08246 1/20 0.39
RXRA P19793 1/20 0.38
SLC6A2 P23975 4/20 0.37
SLC6A4 P31645 4/20 0.37
SLC6A3 Q01959 4/20 0.37
LMNA P02545 1/20 0.37
CNR1 P21554 1/20 0.37
HTR2A P28223 1/20 0.37
HRH1 P35367 1/20 0.37
HRH3 Q9Y5N1 1/20 0.37
LTA4H P09960 2/20 0.35
RARA P10276 3/20 0.35
RARB P10826 3/20 0.35
RARG P13631 3/20 0.35
CTSK P43235 1/20 0.34
SRD5A2 P31213 1/20 0.33
ALDH1A1 P00352 1/20 0.33
CYP19A1 P11511 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18473360 0.82 SLC6A4 (0.42) SLC6A2SLC6A4SLC6A3LMNACNR1
SCHEMBL19428106 0.81 CTSK (0.40) SLC6A2SLC6A4SLC6A3LMNACNR1
SCHEMBL1839821 0.79 ESR2 (0.45) SLC6A2SLC6A4SLC6A3LTA4HCYP19A1
SCHEMBL14706805 0.78 ALDH1A1 (0.46) SLC6A2SLC6A4SLC6A3ALDH1A1
SCHEMBL18477985 0.77 POLB (0.40) LMNAHRH3ALDH1A1
SCHEMBL1836787 0.77 ESR2 (0.43) SLC6A2SLC6A4SLC6A3LMNALTA4H
SCHEMBL18478361 0.77 SLC6A2 (0.34) SLC6A2SLC6A4SLC6A3LMNACNR1
SCHEMBL19428104 0.76 DRD2 (0.33) SLC6A2SLC6A4SLC6A3LMNACNR1
SCHEMBL18372573 0.76 ELANE (0.37) ELANERXRASLC6A2SLC6A4SLC6A3
SCHEMBL14706809 0.76 ALDH1A1 (0.47) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9829792-B2 Monomer, polymer, positive resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-11-28 US disclosed
US-20170008982-A1 MONOMER, POLYMER, POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-01-12 US disclosed
US-20170008982-A1 MONOMER, POLYMER, POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-01-12 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20170008982-A1 MONOMER, POLYMER, POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS PARG, PARN, MMS19 ELANE 1421/4885RXRA 978/4885SLC6A2 4543/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.