Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | TP53 | P04637 | 1/20 | 0.31 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.31 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1825618 | 0.83 | ALDH1A1 (0.31) | ALDH1A1TSHRCYP3A4 | |
| SCHEMBL1843381 | 0.82 | — | — | |
| Methacrylic Acid SCHEMBL9137100 | 0.78 | ALDH1A1 (0.44) | ALDH1A1TSHRTP53CYP3A4MAPK1 | |
| Acrylic Acid Ethyl Ester SCHEMBL1822973 | 0.77 | ALDH1A1 (0.33) | ALDH1A1TSHRTP53CYP3A4MAPK1 | |
| SCHEMBL9299705 | 0.77 | ALDH1A1 (0.43) | ALDH1A1TSHRCYP3A4 | |
| SCHEMBL19597 | 0.75 | TGFBR1 (0.35) | — | |
| SCHEMBL9773819 | 0.74 | ALDH1A1 (0.40) | ALDH1A1TSHRCYP3A4 | |
| Vinylsulfonic Acid SCHEMBL9481117 | 0.74 | TGFBR1 (0.31) | — | |
| Methacrylic Acid SCHEMBL27682856 | 0.74 | ALDH1A1 (0.40) | ALDH1A1TSHRCYP3A4 | |
| SCHEMBL30013661 | 0.74 | ALDH1A1 (0.46) | ALDH1A1TSHRTP53CYP3A4MAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1818723-B1 | COMPOSITION FOR FORMING ANTIREFLECTION FILM, LAYERED PRODUCT, AND METHOD OF FORMING RESIST PATTERN | JSR CORP (JP) | 2011-05-04 | — | — | EP | disclosed |
| US-7709182-B2 | Composition for forming antireflection film, layered product, and method of forming resist pattern | JSR CORPORATION (JP) | 2010-05-04 | — | — | US | disclosed |
| US-20080124524-A1 | Composition For Forming Antireflection Film, Layered Product, And Method Of Forming Resist Pattern | JSR CORPORATION (JP) | 2008-05-29 | — | — | US | disclosed |
| EP-1818723-A1 | COMPOSITION FOR FORMING ANTIREFLECTION FILM, LAYERED PRODUCT, AND METHOD OF FORMING RESIST PATTERN | JSR Corporation (JP) | 2007-08-15 | — | — | EP | disclosed |