Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.30 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.30 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9299705 | 0.85 | ALDH1A1 (0.43) | ALDH1A1TSHRCYP3A4CYP2C9CYP2C19 | |
| SCHEMBL1839152 | 0.83 | ALDH1A1 (0.33) | ALDH1A1TSHRCYP3A4 | |
| Methacrylic Acid SCHEMBL27682856 | 0.82 | ALDH1A1 (0.40) | ALDH1A1TSHRCYP3A4CYP2C9CYP2C19 | |
| Acrylic Acid Ethyl Ester SCHEMBL1822973 | 0.78 | ALDH1A1 (0.33) | ALDH1A1TSHRCYP3A4CYP2C9CYP2C19 | |
| SCHEMBL7911836 | 0.77 | ALDH1A1 (0.36) | ALDH1A1TSHRCYP3A4CYP2C9CYP2C19 | |
| Acrylic Acid Methyl Ester SCHEMBL8758796 | 0.77 | ALDH1A1 (0.41) | ALDH1A1TSHRCYP3A4CYP2C9CYP2C19 | |
| SCHEMBL8965669 | 0.75 | ALDH1A1 (0.35) | ALDH1A1TSHRCYP3A4CYP2C9CYP2C19 | |
| SCHEMBL28820478 | 0.75 | ALDH1A1 (0.44) | ALDH1A1TSHRCYP3A4CYP2C9CYP2C19 | |
| Methacrylic Acid SCHEMBL27702048 | 0.75 | TSHR (0.44) | ALDH1A1TSHRCYP3A4CYP2C9CYP2C19 | |
| Itaconate SCHEMBL9138161 | 0.74 | ALOX15 (0.42) | ALDH1A1TSHRCYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1818723-B1 | COMPOSITION FOR FORMING ANTIREFLECTION FILM, LAYERED PRODUCT, AND METHOD OF FORMING RESIST PATTERN | JSR CORP (JP) | 2011-05-04 | — | — | EP | disclosed |
| US-7709182-B2 | Composition for forming antireflection film, layered product, and method of forming resist pattern | JSR CORPORATION (JP) | 2010-05-04 | — | — | US | disclosed |
| US-20080124524-A1 | Composition For Forming Antireflection Film, Layered Product, And Method Of Forming Resist Pattern | JSR CORPORATION (JP) | 2008-05-29 | — | — | US | disclosed |
| EP-1818723-A1 | COMPOSITION FOR FORMING ANTIREFLECTION FILM, LAYERED PRODUCT, AND METHOD OF FORMING RESIST PATTERN | JSR Corporation (JP) | 2007-08-15 | — | — | EP | disclosed |