SCHEMBL18401259

SCHEMBL18401259

CCCOC(=O)C1(C)CC2CCC1C2

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 7/20 0.33
NPSR1 Q6W5P4 2/20 0.33
MEN1 O00255 4/20 0.33
KMT2A Q03164 4/20 0.33
L3MBTL1 Q9Y468 2/20 0.33
ALDH1A1 P00352 1/20 0.33
MAPT P10636 1/20 0.33
ATM Q13315 1/20 0.33
PPM1B O75688 1/20 0.32
PTPN1 P18031 1/20 0.32
PPP1CC P36873 1/20 0.32
CYP3A4 P08684 2/20 0.31
ALOX5AP P20292 1/20 0.31
ABCB11 O95342 1/20 0.31
LMNA P02545 1/20 0.31
CYP1A2 P05177 1/20 0.31
CHRM2 P08172 1/20 0.31
CHRM4 P08173 1/20 0.31
CHRM5 P08912 1/20 0.31
CYP2D6 P10635 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27562595 0.91 LMNA (0.37) EPHX2NPSR1MEN1KMT2AALDH1A1
SCHEMBL13799151 0.88 ALOX5AP (0.40) NPSR1ALOX5APHSD11B1
SCHEMBL13952831 0.87 F10 (0.37) EPHX2KMT2AALDH1A1PTPN1CYP3A4
SCHEMBL21895374 0.80 EPHX2 (0.34) EPHX2TSHRHSD11B1
SCHEMBL23827194 0.80 EPHX2 (0.33) EPHX2NPSR1MEN1KMT2AL3MBTL1
SCHEMBL4863538 0.80 HSD11B1 (0.32) HSD11B1
SCHEMBL27562604 0.79 HTT (0.33) EPHX2HSD11B1
SCHEMBL4740020 0.78 ALDH1A1 (0.33) EPHX2NPSR1MEN1KMT2AL3MBTL1
SCHEMBL21430673 0.77 EGFR (0.30)
SCHEMBL17070184 0.76 LIPA (0.32) ALDH1A1HSD11B1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20200050106-A1 PHOTOSENSITIVE COMPOSITION FOR EUV LIGHT, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2020-02-13 US disclosed
US-9766547-B2 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method of manufacturing electronic device using the same, and electronic device FUJIFILM CORPORATION (JP) 2017-09-19 US disclosed
US-9551928-B2 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern therewith FUJIFILM CORPORATION (JP) 2017-01-24 US disclosed