Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.35 |
| ▸ | THRB | P10828 | 1/20 | 0.35 |
| ▸ | CA1 | P00915 | 1/20 | 0.31 |
| ▸ | CA2 | P00918 | 1/20 | 0.31 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2632786 | 0.91 | TSHR (0.35) | TSHRALDH1A1THRB | |
| SCHEMBL20100448 | 0.87 | CA1 (0.31) | CA1CA2 | |
| SCHEMBL13467163 | 0.86 | TSHR (0.34) | TSHRALDH1A1THRB | |
| SCHEMBL13466318 | 0.86 | THRB (0.39) | TSHRALDH1A1THRB | |
| SCHEMBL13451535 | 0.85 | THRB (0.35) | TSHRALDH1A1THRB | |
| SCHEMBL13451530 | 0.84 | TSHR (0.43) | TSHRALDH1A1THRB | |
| SCHEMBL10064116 | 0.83 | TSHR (0.39) | TSHRALDH1A1THRB | |
| SCHEMBL15498958 | 0.83 | TSHR (0.36) | TSHRALDH1A1THRB | |
| SCHEMBL13466319 | 0.80 | TSHR (0.34) | TSHRALDH1A1THRB | |
| SCHEMBL18455477 | 0.78 | CA1 (0.34) | CA1CA2MAPK1SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 169 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117712499-A | High-voltage-resistant solid-state battery and preparation method thereof | 电子科技大学 | 2024-03-15 | — | — | CN | claimed |
| CN-116987225-B | Photoresist polymer for 193nm, preparation method thereof and photoresist composition | 甘肃华隆芯材料科技有限公司 | 2023-12-22 | — | — | CN | claimed |
| CN-116987225-A | Photoresist polymer for 193nm, preparation method thereof and photoresist composition | 甘肃华隆芯材料科技有限公司 | 2023-11-03 | — | — | CN | claimed |
| CN-116199858-A | Enclosed isocyanate oligomer, in-situ photo-thermal dual-curing resin, preparation method and printing method thereof | 上海信斯帝克新材料有限公司 | 2023-06-02 | — | — | CN | claimed |
| CN-117712499-A | High-voltage-resistant solid-state battery and preparation method thereof | 电子科技大学 | 2024-03-15 | — | — | CN | disclosed |
| CN-117452768-A | Composition for immersion photoresist top coating | 徐州博康信息化学品有限公司 | 2024-01-26 | — | — | CN | disclosed |
| US-20240027904-A1 | PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-01-25 | — | — | US | disclosed |
| US-20240027905-A1 | PHOTOACID GENERATORS, PHOTORESIST COMPOSITIONS, AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-01-25 | — | — | US | disclosed |
| US-20240019779-A1 | COMPOUNDS AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-01-18 | — | — | US | disclosed |
| US-20240019779-A1 | COMPOUNDS AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-01-18 | — | — | US | disclosed |
| CN-116987225-B | Photoresist polymer for 193nm, preparation method thereof and photoresist composition | 甘肃华隆芯材料科技有限公司 | 2023-12-22 | — | — | CN | disclosed |
| CN-116987225-A | Photoresist polymer for 193nm, preparation method thereof and photoresist composition | 甘肃华隆芯材料科技有限公司 | 2023-11-03 | — | — | CN | disclosed |
| US-20120028188-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-02-02 | — | — | US | disclosed |
| US-20120028188-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-02-02 | — | — | US | disclosed |
| US-20110207051-A1 | Sulfonamide-Containing Topcoat and Photoresist Additive Compositions and Methods of Use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-08-25 | — | — | US | disclosed |
| WO-2011101260-A2 | SULFONAMIDE-CONTAINING PHOTORESIST COMPOSITIONS AND METHODS OF USE | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-08-25 | — | — | WO | disclosed |
| US-20110207052-A1 | SULFONAMIDE-CONTAINING PHOTORESIST COMPOSITIONS AND METHODS OF USE | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-08-25 | — | — | US | disclosed |
| WO-2011101259-A2 | SULFONAMIDE-CONTAINING TOPCOAT AND PHOTORESIST ADDITIVE COMPOSITIONS AND METHODS OF USE | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-08-25 | — | — | WO | disclosed |
| US-20110111342-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 2011-05-12 | — | — | US | disclosed |
| US-20110111342-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 2011-05-12 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20240019779-A1 | COMPOUNDS AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME | CRY1, CCNT1, CCNA1 | TSHR 3135/4885ALDH1A1 382/4885THRB 3729/4885 |
| US-20240027904-A1 | PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | C1S, C1R, CRY2 | TSHR 839/4885ALDH1A1 3079/4885THRB 2348/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.