Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.31 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL184606 | 0.68 | CYP2A6 (0.33) | CYP2A6ALOX12 | |
| SCHEMBL1173835 | 0.68 | — | — | |
| SCHEMBL70153 | 0.67 | CYP2A6 (0.36) | ALDH1A1CYP2A6ALOX12 | |
| SCHEMBL1587229 | 0.67 | ALDH1A1 (0.37) | ALDH1A1CYP2A6 | |
| SCHEMBL4855476 | 0.62 | ALDH1A1 (0.47) | ALDH1A1CYP2A6 | |
| SCHEMBL20678505 | 0.61 | ALDH1A1 (0.33) | ALDH1A1 | |
| SCHEMBL994884 | 0.59 | — | — | |
| SCHEMBL56536 | 0.59 | MAPT (0.32) | — | |
| SCHEMBL10796479 | 0.59 | ALDH1A1 (0.37) | ALDH1A1CYP2A6 | |
| SCHEMBL1976862 | 0.59 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 302 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12044094-B2 | Plug, downhole tool, and well treatment method | KUREHA CORPORATION (JP) | 2024-07-23 | — | — | US | disclosed |
| EP-3405010-B1 | MULTILAYER TRANSMISSION LINE PLATE | RESONAC CORP (JP) | 2024-06-26 | — | — | EP | disclosed |
| US-12013636-B2 | Salt, acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-06-18 | — | — | US | disclosed |
| CN-113527101-B | Novel compound, polymer, process for producing the same, photosensitive resin composition, pattern forming process, cured film, and electronic component | 信越化学工业株式会社 | 2024-04-23 | — | — | CN | disclosed |
| US-20240122065-A1 | METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN | TOSOH CORPORATION (JP) | 2024-04-11 | — | — | US | disclosed |
| US-20240117101-A1 | COMPOSITION FOR FILM FORMATION, RESIST COMPOSITION, RADIATION-SENSITIVE COMPOSITION, METHOD FOR PRODUCING AMORPHOUS FILM, RESIST PATTERN FORMATION METHOD, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, METHOD FOR PRODUCING UNDERLAYER FILM FOR LITHOGRAPHY, CIRCUIT PATTERN FORMATION METHOD, COMPOSITION FOR OPTICAL MEMBER FORMATION, RESIN FOR UNDERLAYER FILM FORMATION, RESIST RESIN, RADIATION-SENSITIVE RESIN, AND RESIN FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2024-04-11 | — | — | US | disclosed |
| US-20240117102-A1 | POLYMER, COMPOSITION, METHOD FOR PRODUCING POLYMER, COMPOSITION FOR FILM FORMATION, RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, RADIATION-SENSITIVE COMPOSITION, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, METHOD FOR PRODUCING UNDERLAYER FILM FOR LITHOGRAPHY, CIRCUIT PATTERN FORMATION METHOD, AND COMPOSITION FOR OPTICAL MEMBER FORMATION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2024-04-11 | — | — | US | disclosed |
| US-11932762-B2 | Adhesive for endoscope, cured product, endoscope, and method for producing endoscope | FUJIFILM CORPORATION (JP) | 2024-03-19 | — | — | US | disclosed |
| WO-2024043083-A1 | RESIN COMPOSITION, PREPREG, FILM WITH RESIN, METAL FOIL WITH RESIN, METAL-CLAD LAMINATED PLATE, AND WIRING BOARD | パナソニックＩＰマネジメント株式会社 | 2024-02-29 | — | — | WO | disclosed |
| WO-2024043084-A1 | RESIN COMPOSITION, PREPREG, FILM WITH RESIN, METAL FOIL WITH RESIN, METAL-CLAD LAMINATE, AND WIRING BOARD | パナソニックＩＰマネジメント株式会社 | 2024-02-29 | — | — | WO | disclosed |
| US-20050037286-A1 | Light sensitive composition, planographic printing plate material, and image formation method | KONICA MINOLTA MEDICAL & GRAPHIC, INC. (JP) | 2005-02-17 | — | — | US | disclosed |
| US-20040219459-A1 | Producing method of photosensitive planographic printing plate and printing plate produced thereby | KONICA MINOLTA MEDICAL & GRAPHIC INC. (JP) | 2004-11-04 | — | — | US | disclosed |
| US-20040197064-A1 | Polyimide optical materials, polyimide precursor solutions and optical waveguide elements | KABUSHIKI KAISHA TOSHIBA (JP) | 2004-10-07 | — | — | US | disclosed |
| US-20040091816-A1 | Photosensitive composition and photosensitive lithographic printing plate | KONICA MINOLTA HOLDINGS, INC. (JP) | 2004-05-13 | — | — | US | disclosed |
| EP-1413925-A2 | Photosensitive composition and photosensitive lithographic printing plate | KONICA MINOLTA HOLDINGS, INC. (JP) | 2004-04-28 | — | — | EP | disclosed |
| US-20040005515-A1 | Light sensitive planographic printing plate precursor and its processing method | KONICA CORPORATION (JP) | 2004-01-08 | — | — | US | disclosed |
| EP-1378793-A2 | Light sensitive planographic printing plate precursor | KONICA CORPORATION (JP) | 2004-01-07 | — | — | EP | disclosed |
| EP-0517542-A1 | Organic electroluminescence devices | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1992-12-09 | — | — | EP | disclosed |
| US-4333868-A | Phosphite ester stabilizers | CIBA-GEIGY CORPORATION (US) | 1982-06-08 | — | — | US | disclosed |
| US-4132702-A | Phenol esters and amides and polymers stabilized therewith | CIBA-GEIGY CORPORATION (US) | 1979-01-02 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12013636-B2 | Salt, acid generator, resist composition and method for producing resist pattern | RER1, FGFR1, NHERF1 | ALDH1A1 861/4885CYP2A6 484/4885ALOX12 748/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.