SCHEMBL18535804

SCHEMBL18535804

CC(O)(c1ccc(-c2ccccc2)cc1)c1ccc(-c2ccccc2)cc1

nearest known ligand 0.56

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
CYP2C9 P11712 1/20 0.56
KMT2A Q03164 2/20 0.52
MEN1 O00255 1/20 0.52
KIF11 P52732 1/20 0.52
PTPN5 P54829 1/20 0.47
MMP3 P08254 1/20 0.46
BCL2L1 Q07817 1/20 0.46
ALDH1A1 P00352 2/20 0.45
ESR1 P03372 2/20 0.43
ESR2 Q92731 2/20 0.43
CYP3A4 P08684 2/20 0.43
MAPT P10636 2/20 0.43
SMN1; SMN2 Q16637 1/20 0.43
CYP17A1 P05093 1/20 0.42
AKT1 P31749 1/20 0.41
AKT2 P31751 1/20 0.41
CA1 P00915 1/20 0.41
CA2 P00918 1/20 0.41
MGLL Q99685 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18639619 0.98 CYP2C9 (0.54) CYP2C9KMT2AMEN1KIF11PTPN5
SCHEMBL17111066 0.89 KMT2A (0.46) CYP2C9KMT2AMEN1KIF11PTPN5
SCHEMBL4506291 0.85 CYP2C9 (0.56) CYP2C9KMT2AKIF11PTPN5MMP3
SCHEMBL429422 0.85 CYP2C9 (0.56) CYP2C9KMT2AKIF11PTPN5MMP3
SCHEMBL9279490 0.85 CYP2C9 (0.56) CYP2C9KMT2AKIF11PTPN5MMP3
SCHEMBL249404 0.84 KMT2A (0.55) CYP2C9KMT2AMEN1ALDH1A1ESR1
Ammonia Solution, Strong SCHEMBL11855911 0.81 KMT2A (0.52) CYP2C9KMT2AMEN1ALDH1A1ESR1
SCHEMBL6982792 0.79 RXRA (0.53) CYP2C9KIF11PTPN5CYP3A4CYP17A1
SCHEMBL25489530 0.79 CYP2C9 (0.60) CYP2C9KIF11PTPN5MMP3BCL2L1
SCHEMBL3421942 0.79 KIF11 (0.59) CYP2C9KIF11PTPN5ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11664093-B2 Extrapolative prediction of enantioselectivity enabled by computer-driven workflow, new molecular representations and machine learning THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS (US) 2023-05-30 US disclosed
EP-3141958-A2 CHEMICALLY AMPLIFIED RESIST MATERIAL AND RESIST PATTERN-FORMING METHOD JSR Corporation (JP) 2017-03-15 EP disclosed
EP-3133444-A1 CHEMICALLY AMPLIFIED RESIST MATERIAL, PATTERN-FORMING METHOD, COMPOUND, AND PRODUCTION METHOD OF COMPOUND OSAKA UNIVERSITY (JP) 2017-02-22 EP disclosed
EP-3133445-A1 CHEMICALLY AMPLIFIED RESIST MATERIAL OSAKA UNIVERSITY (JP) 2017-02-22 EP disclosed