Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2C9 | P11712 | 1/20 | 0.56 |
| ▸ | KIF11 | P52732 | 1/20 | 0.52 |
| ▸ | TNKS | O95271 | 1/20 | 0.47 |
| ▸ | PARP1 | P09874 | 1/20 | 0.47 |
| ▸ | TNKS2 | Q9H2K2 | 1/20 | 0.47 |
| ▸ | PTPN5 | P54829 | 1/20 | 0.47 |
| ▸ | MMP3 | P08254 | 1/20 | 0.46 |
| ▸ | BCL2L1 | Q07817 | 1/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.45 |
| ▸ | ESR1 | P03372 | 2/20 | 0.43 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.43 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.43 |
| ▸ | MAPT | P10636 | 2/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.43 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.43 |
| ▸ | CYP17A1 | P05093 | 1/20 | 0.42 |
| ▸ | OPRD1 | P41143 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.41 |
| ▸ | AKT1 | P31749 | 1/20 | 0.41 |
| ▸ | AKT2 | P31751 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4506291 | 1.00 | CYP2C9 (0.56) | CYP2C9KIF11TNKSPARP1TNKS2 | |
| SCHEMBL4517154 | 0.91 | CYP2C9 (0.48) | CYP2C9KIF11TNKSPARP1TNKS2 | |
| SCHEMBL18802754 | 0.89 | KIF11 (0.44) | CYP2C9KIF11TNKSPARP1TNKS2 | |
| SCHEMBL547767 | 0.89 | KIF11 (0.44) | CYP2C9KIF11TNKSPARP1TNKS2 | |
| SCHEMBL4509959 | 0.89 | CYP2C9 (0.45) | CYP2C9KIF11TNKSPARP1TNKS2 | |
| SCHEMBL18535804 | 0.85 | CYP2C9 (0.56) | CYP2C9KIF11PTPN5MMP3BCL2L1 | |
| SCHEMBL9279490 | 0.85 | CYP2C9 (0.56) | CYP2C9KIF11PTPN5MMP3BCL2L1 | |
| SCHEMBL8683368 | 0.84 | ALDH1A1 (0.52) | CYP2C9ALDH1A1ESR1ESR2CYP3A4 | |
| SCHEMBL164244 | 0.84 | ALDH1A1 (0.52) | CYP2C9ALDH1A1ESR1ESR2CYP3A4 | |
| SCHEMBL28216352 | 0.84 | ALDH1A1 (0.52) | CYP2C9ALDH1A1ESR1ESR2CYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 169 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113453724-B | Sulfonylmaleimide-based linkers and corresponding conjugates | 皮埃尔法布雷医药公司 | 2025-02-25 | — | — | CN | disclosed |
| US-11852970-B2 | Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-12-26 | — | — | US | disclosed |
| US-11572430-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-02-07 | — | — | US | disclosed |
| CN-114685243-B | Green and efficient preparation method of 2-phenyl-2-propanol series compounds | 大连理工大学 | 2023-02-07 | — | — | CN | disclosed |
| CN-114685243-A | Green and efficient preparation method of 2-phenyl-2-propanol series compounds | 大连理工大学 | 2022-07-01 | — | — | CN | disclosed |
| CN-110423185-B | Method for selectively oxidizing cumene compound | 浙江工业大学 | 2022-03-18 | — | — | CN | disclosed |
| US-11243467-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2022-02-08 | — | — | US | disclosed |
| US-20220023438-A1 | SULFOMALEIMIDE-BASED LINKERS AND CORRESPONDING CONJUGATES | PIERRE FABRE MEDICAMENT (FR) | 2022-01-27 | — | — | US | disclosed |
| EP-3062151-B1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR USE IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM | MITSUBISHI GAS CHEMICAL CO (JP) | 2021-05-05 | — | — | EP | disclosed |
| EP-3141957-B1 | RESIST MATERIAL, RESIST COMPOSITION, AND RESIST PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL CO (JP) | 2021-03-24 | — | — | EP | disclosed |
| US-20070105041-A1 | Lithographic printing plate comprising bi-functional compounds | AGFA-GEVAERT (BE) | 2007-05-10 | — | — | US | disclosed |
| US-20070105041-A1 | Lithographic printing plate comprising bi-functional compounds | AGFA-GEVAERT (BE) | 2007-05-10 | — | — | US | disclosed |
| CN-1942825-A | Resist composition | MITSUBISHI GAS CHEMICAL CO (JP) | 2007-04-04 | — | — | CN | disclosed |
| EP-1739485-A1 | RESIST COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2007-01-03 | — | — | EP | disclosed |
| US-20030022095-A1 | Negative type radiation sensitive resin composition | JSR CORPORATION (JP) | 2003-01-30 | — | — | US | disclosed |
| EP-0267759-B1 | OXIDATION PROCESS OF AROMATIC COMPOUNDS | KUREHA KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1993-03-10 | — | — | EP | disclosed |
| US-4825007-A | Oxidation process of aromatic compounds | KUREHA KAGAKU KOGYO K.K. (JP) | 1989-04-25 | — | — | US | disclosed |
| US-4423038-A | Phosphoryl compounds, pharmaceutical preparations containing such compounds, and their use | CIBA-GEIGY CORPORATION (US) | 1983-12-27 | — | — | US | disclosed |
| EP-0056992-A1 | Phosphorylated derivatives, pharmaceutical compositions containing such derivatives, and their use | CIBA-GEIGY AG (CH) | 1982-08-04 | — | — | EP | disclosed |
| US-4159981-A | CYCLIC POLYPEPTIDES, DEETHERIFICATION, DEESTERIFICATION | CIBA-GEIGY CORPORATION (US) | 1979-07-03 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20220023438-A1 | SULFOMALEIMIDE-BASED LINKERS AND CORRESPONDING CONJUGATES | CSGALNACT1, CD44, IGLV6-57 | CYP2C9 1626/4885KIF11 154/4885TNKS 4022/4885 |
| US-11852970-B2 | Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin | SLC39A11, CROCC, TERB1 | CYP2C9 2626/4885KIF11 682/4885TNKS 2350/4885 |
| US-11572430-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | C9, C5, C1R | CYP2C9 636/4885KIF11 3842/4885TNKS 2476/4885 |
| US-11243467-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | C9, C5, C1R | CYP2C9 636/4885KIF11 3842/4885TNKS 2476/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.