Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.57 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.57 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.57 |
| ▸ | TSHR | P16473 | 3/20 | 0.54 |
| ▸ | HRH3 | Q9Y5N1 | 2/20 | 0.49 |
| ▸ | LMNA | P02545 | 1/20 | 0.49 |
| ▸ | HTR1A | P08908 | 1/20 | 0.49 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.49 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.49 |
| ▸ | ADRA2C | P18825 | 1/20 | 0.49 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.49 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.49 |
| ▸ | EBP | Q15125 | 1/20 | 0.49 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.49 |
| ▸ | FPR3 | P25089 | 1/20 | 0.48 |
| ▸ | FPR2 | P25090 | 1/20 | 0.48 |
| ▸ | GLA | P06280 | 1/20 | 0.46 |
| ▸ | MAPT | P10636 | 4/20 | 0.45 |
| ▸ | POLB | P06746 | 2/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11732584 | 0.98 | SMN1; SMN2 (0.60) | SMN1; SMN2CYP1A2MAPK1TSHRHRH3 | |
| SCHEMBL2127041 | 0.98 | SMN1; SMN2 (0.60) | SMN1; SMN2CYP1A2MAPK1TSHRHRH3 | |
| Hydrochloric Acid SCHEMBL4924873 | 0.96 | SMN1; SMN2 (0.58) | SMN1; SMN2CYP1A2MAPK1TSHRHRH3 | |
| SCHEMBL15150928 | 0.96 | TSHR (0.54) | SMN1; SMN2CYP1A2MAPK1TSHRHRH3 | |
| SCHEMBL28390299 | 0.92 | PAOX (0.53) | SMN1; SMN2CYP1A2MAPK1TSHRHRH3 | |
| SCHEMBL9856869 | 0.92 | SMN1; SMN2 (0.53) | SMN1; SMN2CYP1A2MAPK1TSHRHRH3 | |
| SCHEMBL11570934 | 0.92 | TSHR (0.58) | SMN1; SMN2CYP1A2MAPK1TSHRHRH3 | |
| Formic Acid SCHEMBL28117669 | 0.91 | SMN1; SMN2 (0.53) | SMN1; SMN2CYP1A2MAPK1TSHRHRH3 | |
| SCHEMBL20179502 | 0.91 | HRH3 (0.54) | SMN1; SMN2CYP1A2MAPK1TSHRHRH3 | |
| SCHEMBL15920926 | 0.91 | HRH3 (0.54) | SMN1; SMN2CYP1A2MAPK1TSHRHRH3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107698539-A | The preparation method of Buflomedil Hydrochloride | 陕西启源科技发展有限责任公司 | 2018-02-16 | — | — | CN | claimed |
| CN-107698539-A | The preparation method of Buflomedil Hydrochloride | 陕西启源科技发展有限责任公司 | 2018-02-16 | — | — | CN | disclosed |
| CN-107698539-A | The preparation method of Buflomedil Hydrochloride | 陕西启源科技发展有限责任公司 | 2018-02-16 | — | — | CN | disclosed |
| US-8283104-B2 | Sulfonate and its derivative, photosensitive acid generator, and resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-10-09 | — | — | US | disclosed |
| EP-2323988-A1 | ALPHA7 NICOTINIC ACETYLCHOLINE RECEPTOR INHIBITORS | Wyeth LLC (US) | 2011-05-25 | — | — | EP | disclosed |
| US-20100209827-A1 | NOVEL SULFONATE AND ITS DERIVATIVE, PHOTOSENSITIVE ACID GENERATOR, AND RESIST COMPOSITION AND PATTERNING PROCESS USING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-08-19 | — | — | US | disclosed |
| US-7771913-B2 | Resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-08-10 | — | — | US | disclosed |
| US-20100130474-A1 | ALPHA7 NICOTINIC ACETYLCHOLINE RECEPTOR INHIBITORS | WYETH (US) | 2010-05-27 | — | — | US | disclosed |
| US-7655378-B2 | Negative resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-02-02 | — | — | US | disclosed |
| WO-2010009290-A1 | ALPHA7 NICOTINIC ACETYLCHOLINE RECEPTOR INHIBITORS | WYETH (US) | 2010-01-21 | — | — | WO | disclosed |
| US-20080020290-A1 | Negative resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-01-24 | — | — | US | disclosed |
| US-20080020289-A1 | Novel polymer, positive resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-01-24 | — | — | US | disclosed |
| US-20070231738-A1 | Resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-10-04 | — | — | US | disclosed |
| US-7232641-B2 | Polymerizable compound, polymer, positive-resist composition, and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-06-19 | — | — | US | disclosed |
| US-20070111140-A1 | Resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-17 | — | — | US | disclosed |
| US-7189493-B2 | Polymer, positive resist composition, and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-03-13 | — | — | US | disclosed |
| US-20060147836-A1 | Resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-07-06 | — | — | US | disclosed |
| US-4049653-A | ANALGESICS, ANTIANXIETY AGENTS | ABBOTT LABORATORIES (US) | 1977-09-20 | — | — | US | disclosed |
| US-4025630-A | Anesthesia methods using benzopyrans and esters thereof as pre-anesthesia medication | ABBOTT LABORATORIES (US) | 1977-05-24 | — | — | US | disclosed |
| US-3941782-A | Heterocyclic esters of benzopyrans | SHARPS ASSOCIATES (US) | 1976-03-02 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100130474-A1 | ALPHA7 NICOTINIC ACETYLCHOLINE RECEPTOR INHIBITORS | CHRNA7, CHRNA6, CHRNA2 | SMN1; SMN2 1693/4885CYP1A2 2584/4885MAPK1 1513/4885 |
| US-20100209827-A1 | NOVEL SULFONATE AND ITS DERIVATIVE, PHOTOSENSITIVE ACID GENERATOR, AND RESIST COMPOSITION AND PATTERNING PROCESS USING THE SAME | DAP3, MRPS23, ASIC3 | SMN1; SMN2 1484/4885CYP1A2 3322/4885MAPK1 2277/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.