SCHEMBL18600610

SCHEMBL18600610

C=CC(=O)Oc1cccc2c3ccc4ccc5ccccc5c4c3c3ccccc3c12

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TYMS P04818 1/20 0.44
▸ ALDH1A1 P00352 5/20 0.42
▸ HSD17B10 Q99714 4/20 0.42
▸ HPGD P15428 3/20 0.42
▸ THRB P10828 2/20 0.42
▸ CYP1A2 P05177 2/20 0.42
▸ GAA P10253 2/20 0.40
▸ THRA P10827 1/20 0.40
▸ PGR P06401 1/20 0.40
▸ PTGS1 P23219 1/20 0.40
▸ MAPK1 P28482 1/20 0.40
▸ KMT2A Q03164 4/20 0.39
▸ MEN1 O00255 2/20 0.39
▸ L3MBTL1 Q9Y468 2/20 0.39
▸ RAB9A P51151 1/20 0.39
▸ ACHE P22303 2/20 0.39
▸ ERBB2 P04626 1/20 0.39
▸ FYN P06241 1/20 0.39
▸ MAOA P21397 1/20 0.39
▸ AHR P35869 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29733229 0.90 TYMS (0.45) TYMSALDH1A1HSD17B10HPGDTHRB
SCHEMBL29117894 0.86 TYMS (0.51) TYMSALDH1A1HSD17B10HPGDTHRB
SCHEMBL28826343 0.84 TYMS (0.50) TYMSALDH1A1HSD17B10HPGDTHRB
SCHEMBL29374139 0.83 ALDH1A1 (0.56) TYMSALDH1A1HSD17B10HPGDTHRB
SCHEMBL68437 0.83 ALDH1A1 (0.56) TYMSALDH1A1HSD17B10HPGDTHRB
SCHEMBL31155341 0.83 TYMS (0.47) TYMSALDH1A1HSD17B10HPGDTHRB
SCHEMBL69482 0.82 TYMS (0.48) TYMSALDH1A1HSD17B10HPGDTHRB
SCHEMBL29617395 0.82 TYMS (0.48) TYMSALDH1A1HSD17B10HPGDTHRB
SCHEMBL29733303 0.82 TYMS (0.48) TYMSALDH1A1HSD17B10HPGDTHRB
SCHEMBL18600605 0.82 ALDH1A1 (0.42) ALDH1A1HSD17B10HPGDTHRBCYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3141957-B1 RESIST MATERIAL, RESIST COMPOSITION, AND RESIST PATTERN FORMATION METHOD MITSUBISHI GAS CHEMICAL CO (JP) 2021-03-24 — — EP disclosed
US-10437148-B2 Resist material, resist composition and method for forming resist pattern MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2019-10-08 — — US disclosed
US-10310377-B2 Material for forming film for lithography, composition for forming film for lithography, film for lithography, pattern forming method and purification method MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2019-06-04 — — US disclosed
EP-3141959-B1 LITHOGRAPHIC FILM FORMATION MATERIAL, COMPOSITION FOR LITHOGRAPHIC FILM FORMATION, LITHOGRAPHIC FILM, PATTERN FORMATION METHOD, AND PURIFICATION METHOD MITSUBISHI GAS CHEMICAL CO (JP) 2019-01-30 — — EP disclosed
US-20170145142-A1 RESIST MATERIAL, RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2017-05-25 — — US disclosed
US-20170144954-A1 MATERIAL FOR FORMING FILM FOR LITHOGRAPHY, COMPOSITION FOR FORMING FILM FOR LITHOGRAPHY, FILM FOR LITHOGRAPHY, PATTERN FORMING METHOD AND PURIFICATION METHOD MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2017-05-25 — — US disclosed
EP-3141957-A1 RESIST MATERIAL, RESIST COMPOSITION, AND RESIST PATTERN FORMATION METHOD Mitsubishi Gas Chemical Company, Inc. (JP) 2017-03-15 — — EP disclosed
EP-3141959-A1 LITHOGRAPHIC FILM FORMATION MATERIAL, COMPOSITION FOR LITHOGRAPHIC FILM FORMATION, LITHOGRAPHIC FILM, PATTERN FORMATION METHOD, AND PURIFICATION METHOD Mitsubishi Gas Chemical Company, Inc. (JP) 2017-03-15 — — EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20170144954-A1 MATERIAL FOR FORMING FILM FOR LITHOGRAPHY, COMPOSITION FOR FORMING FILM FOR LITHOGRAPHY, FILM FOR LITHOGRAPHY, PATTERN FORMING METHOD AND PURIFICATION METHOD FRG1, MLLT3, FEM1B TYMS 4259/4885ALDH1A1 3533/4885HSD17B10 3620/4885
US-10310377-B2 Material for forming film for lithography, composition for forming film for lithography, film for lithography, pattern forming method and purification method FRG1, MLLT3, FEM1B TYMS 4259/4885ALDH1A1 3533/4885HSD17B10 3620/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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