SCHEMBL18634035

SCHEMBL18634035

CC(C)(C)C(=O)OCC1CC2SC1CC2CC(O)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
▸ SLC18A2 Q05940 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20215495 0.86 — —
SCHEMBL18400957 0.82 ALDH1A1 (0.39) —
SCHEMBL23963206 0.80 ALDH1A1 (0.30) —
SCHEMBL19062321 0.73 CHRM3 (0.33) —
SCHEMBL18457346 0.71 — —
SCHEMBL19335327 0.70 — —
SCHEMBL22516937 0.69 — —
SCHEMBL18697266 0.69 — —
SCHEMBL18476617 0.68 — —
SCHEMBL13073269 0.67 PRKCA (0.36) SLC18A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170075217-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-03-16 — — US disclosed
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