SCHEMBL20215495

SCHEMBL20215495

CCC(C)(I)C(=O)OCC1CC2SC1CC2CC(O)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18634035 0.86 SLC18A2 (0.32) —
SCHEMBL18476617 0.83 — —
SCHEMBL20215479 0.81 — —
SCHEMBL20820948 0.79 — —
SCHEMBL18400957 0.77 ALDH1A1 (0.39) —
SCHEMBL20215499 0.76 CNR2 (0.31) —
SCHEMBL23963206 0.75 ALDH1A1 (0.30) —
SCHEMBL20215497 0.72 — —
SCHEMBL19457792 0.71 — —
SCHEMBL20820947 0.70 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10234757-B2 Polymer, making method, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-03-19 — — US disclosed
US-9989847-B2 Onium salt compound, resist composition, and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-06-05 — — US disclosed
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