SCHEMBL1868528

SCHEMBL1868528

COC(=O)c1ccc(C2=NC(c3ccccc3Cl)(n3c(-c4ccccc4Cl)nc(-c4ccc(C(=O)OC)cc4)c3-c3ccc(C(=O)OC)cc3)N=C2c2ccc(C(=O)OC)cc2)cc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 2/20 0.40
TP53 P04637 1/20 0.40
AKT1 P31749 2/20 0.40
AKT2 P31751 2/20 0.40
MGAM O43451 2/20 0.39
GAA P10253 2/20 0.39
SI P14410 2/20 0.39
MGAM2 Q2M2H8 2/20 0.39
GPBAR1 Q8TDU6 1/20 0.38
DRD2 P14416 1/20 0.38
TBXA2R P21731 1/20 0.38
KDR P35968 1/20 0.37
IDO1 P14902 2/20 0.36
ALDH1A1 P00352 4/20 0.36
HPGD P15428 3/20 0.36
SMN1; SMN2 Q16637 3/20 0.36
PDK2 Q15119 2/20 0.36
DHODH Q02127 1/20 0.35
ALDH1A2 O94788 1/20 0.35
ALDH1A3 P47895 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL476664 0.91 AKT1 (0.42) MAPTTP53AKT1AKT2ALDH1A1
SCHEMBL29370507 0.91 AKT1 (0.42) MAPTTP53AKT1AKT2ALDH1A1
SCHEMBL2788962 0.89 TP53 (0.33) MAPTTP53AKT1AKT2MGAM
SCHEMBL1865943 0.87 AKT1 (0.41) MAPTAKT1AKT2MGAMGAA
SCHEMBL1867410 0.87 AKT1 (0.44) AKT1AKT2MGAMGAASI
SCHEMBL3101056 0.85 KDM4E (0.39) MAPTMGAMGAASIMGAM2
SCHEMBL30358508 0.85 KDM4E (0.39) MAPTMGAMGAASIMGAM2
SCHEMBL1868574 0.85 MGAM (0.42) MAPTAKT1AKT2MGAMGAA
SCHEMBL3094986 0.85 L3MBTL1 (0.39) MAPTALDH1A1HPGDSMN1; SMN2KDM4E
SCHEMBL30358509 0.85 L3MBTL1 (0.39) MAPTALDH1A1HPGDSMN1; SMN2KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1999514-B1 PHOTOSENSITIVE RESIST COMPOSITION FOR COLOR FILTERS FOR USE IN ELECTRONIC PAPER DISPLAY DEVICES CIBA HOLDING INC (CH) 2018-10-03 EP disclosed
US-8927182-B2 Photosensitive resist composition for color filters for use in electronic paper display devices BASF SE (DE) 2015-01-06 US disclosed
US-7935776-B2 having a carboxy group in its main chain and a acryloyl group in its side chain; Color filters AGI CORPORATION (TW) 2011-05-03 US disclosed
US-20100164911-A1 PHOTOSENSITIVE RESIST COMPOSITION FOR COLOR FILTERS FOR USE IN ELECTRONIC PAPER DISPLAY DEVICES CIBA CORPORATION 2010-07-01 US disclosed
EP-1999514-A1 PHOTOSENSITIVE RESIST COMPOSITION FOR COLOR FILTERS FOR USE IN ELECTRONIC PAPER DISPLAY DEVICES Ciba Holding Inc. (CH) 2008-12-10 EP disclosed
US-20080234403-A1 Radiation curable and developable polyurethane and radiation curable and developable photo resist composition containing the same AGI CORPORATION (TW) 2008-09-25 US disclosed
WO-2007113107-A1 PHOTOSENSITIVE RESIST COMPOSITION FOR COLOR FILTERS FOR USE IN ELECTRONIC PAPER DISPLAY DEVICES CIBA HOLDING INC. (CH) 2007-10-11 WO disclosed
EP-1048700-B1 Ink jet color filter resin composition, color filter production process SEIKO EPSON CORP (JP) 2006-11-02 EP disclosed
US-6627364-B2 Contains (A) a colorant, (B) a binder resin and (C) a solvent having a boiling point of 245 degrees C. or more at normal pressure. SEIKO EPSON CORPORATION (JP) 2003-09-30 US disclosed
US-20020128351-A1 Ink jet color filter resin composition, color filter and color filter production process SEIKO EPSON CORPORATION (JP) 2002-09-12 US disclosed
US-6368774-B1 MIXTURE CONTAINING ISOINDOLININE DYE JSR CORPORATION (JP) 2002-04-09 US disclosed
US-6348298-B1 COMPOSITION CONSISTING OF COLORANT CONTAINING PHTHALOCYANINE BLUE AND PHTHALOCYANINE GREEN OR PIGMENT GREEN 36, ALKALI-SOLUBLE RESIN, POLYFUNCTIONAL MONOMER, AND PHOTOPOLYMERIZATION INITIATOR JSR CORPORATION (JP) 2002-02-19 US disclosed
US-6255034-B1 (A) A COLORANT, (B) A BINDER POLYMER, (C) A POLYFUNCTIONAL MONOMER AND (D) AN UNSATURATED AMIDE GROUP-CONTAINING MONOMER OR AN UNSATURATED MONOMER HAVING A CYCLIC AMIDE OR IMIDE GROUP, AND (E) A PHOTOPOLYMERIZATION INITIATOR. JSR CORPORATION (JP) 2001-07-03 US disclosed
EP-1048700-A1 Ink jet color filter resin composition, color filter production process SEIKO EPSON CORPORATION (JP) 2000-11-02 EP disclosed
US-6140019-A Radiation sensitive composition JSR CORPORATION (JP) 2000-10-31 US disclosed
EP-1033625-A1 Radiation sensitive composition JSR Corporation (JP) 2000-09-06 EP disclosed
EP-1033626-A1 Radiation sensitive composition JSR Corporation (JP) 2000-09-06 EP disclosed
US-6013415-A Radiation sensitive composition JSR CORPORATION (JP) 2000-01-11 US disclosed
EP-0902327-A2 Radiation sensitive composition JSR Corporation (JP) 1999-03-17 EP disclosed
EP-0893737-A2 Radiation sensitive composition JSR Corporation (JP) 1999-01-27 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100164911-A1 PHOTOSENSITIVE RESIST COMPOSITION FOR COLOR FILTERS FOR USE IN ELECTRONIC PAPER DISPLAY DEVICES EYA2, PTPN4, PTPN5 MAPT 540/4885TP53 3482/4885AKT1 1547/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.