SCHEMBL3094986

SCHEMBL3094986

Cc1ccc(C2=NC(c3ccccc3Cl)(n3c(-c4ccccc4Cl)nc(-c4ccc(C)cc4)c3-c3ccc(C)cc3)N=C2c2ccc(C)cc2)cc1

nearest known ligand 0.39

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 1/20 0.39
TDP1 Q9NUW8 1/20 0.36
ALDH1A1 P00352 5/20 0.34
KDM4E B2RXH2 4/20 0.34
RAB9A P51151 3/20 0.34
POLB P06746 2/20 0.34
MAPT P10636 1/20 0.34
HSD11B1 P28845 5/20 0.33
LMNA P02545 2/20 0.32
HPGD P15428 2/20 0.32
KMT2A Q03164 1/20 0.32
SMN1; SMN2 Q16637 2/20 0.31
HSD17B10 Q99714 1/20 0.31
PDE2A O00408 1/20 0.31
PDE10A Q9Y233 1/20 0.31
NPC1 O15118 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30358509 1.00 L3MBTL1 (0.39) L3MBTL1TDP1ALDH1A1KDM4ERAB9A
SCHEMBL29359500 0.92 HSD11B1 (0.37) L3MBTL1ALDH1A1KDM4ERAB9AHSD11B1
SCHEMBL29749791 0.92 HSD11B1 (0.37) L3MBTL1ALDH1A1KDM4ERAB9AHSD11B1
SCHEMBL307038 0.92 HSD11B1 (0.37) L3MBTL1ALDH1A1KDM4ERAB9AHSD11B1
SCHEMBL30358506 0.90 GAA (0.33) ALDH1A1KDM4ERAB9AMAPTHSD11B1
SCHEMBL3094974 0.90 GAA (0.33) ALDH1A1KDM4ERAB9AMAPTHSD11B1
SCHEMBL3101056 0.89 KDM4E (0.39) L3MBTL1TDP1ALDH1A1KDM4ERAB9A
SCHEMBL30358508 0.89 KDM4E (0.39) L3MBTL1TDP1ALDH1A1KDM4ERAB9A
SCHEMBL3094971 0.89 HSD11B1 (0.36) POLBHSD11B1SMN1; SMN2
SCHEMBL13645037 0.88 HSD11B1 (0.37) L3MBTL1KDM4ERAB9AMAPTHSD11B1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240317942-A1 THIOL-CONTAINING COMPOSITION, PHOTOSETTING COMPOSITION, AND THERMOSETTING COMPOSITION RESONAC CORPORATION (JP) 2024-09-26 US disclosed
EP-4375302-A1 THIOL-CONTAINING COMPOSITION, PHOTOCURABLE COMPOSITION, AND THERMOSETTING COMPOSITION Resonac Corporation (JP) 2024-05-29 EP disclosed
EP-2017016-B1 METHOD FOR PRODUCING CONDUCTIVE COATING FILM TOYO INK MFG CO (JP) 2019-07-31 EP disclosed
EP-1478668-B1 THIOL COMPOUND, PHOTOPOLYMERIZATION INITIATOR COMPOSITION AND PHOTOSENSITIVE COMPOSITION SHOWA DENKO KK (JP) 2013-04-10 EP disclosed
US-8313800-B2 Method for producing conductive coating film TOYO INK MFG. CO., LTD. (JP) 2012-11-20 US disclosed
US-8283095-B2 Thiourethane compound and photosensitive resin composition SHOWA DENKO K.K. (JP) 2012-10-09 US disclosed
US-20100233596-A1 THIOURETHANE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION SHOWA DENKO K.K. (JP) 2010-09-16 US disclosed
US-7714032-B2 Thiol compound and photosensitive composition using the same SHOWA DENKO K.K. (JP) 2010-05-11 US disclosed
US-7622613-B2 Thiol compound and photosensitive composition using the same SHOWA DENKO K.K. (JP) 2009-11-24 US disclosed
US-20090258241-A1 METHOD FOR PRODUCING CONDUCTIVE COATING FILM TOYO INK MFG. CO., LTD. (JP) 2009-10-15 US disclosed
EP-1805137-B1 THIOL COMPOUND AND PHOTOSENSITIVE COMPOSITION USING THE SAME SHOWA DENKO KK (JP) 2008-03-26 EP disclosed
US-7341828-B2 Thiol compound, photopolymerization initiator composition and photosensitive composition SHOWA DENKO K.K. (JP) 2008-03-11 US disclosed
US-20070083012-A1 Curable polymer compound SHOWA DENKO K.K. (JP) 2007-04-12 US disclosed
US-20070021571-A1 Curable polymer compound SHOWA DENKO K.K. (JP) 2007-01-25 US disclosed
US-20060079593-A1 Hexaarylbiimidazole compounds and photopolymerization initiator compositions containing the same SHOWA DENKO K.K. (JP) 2006-04-13 US disclosed
US-20060041053-A1 Color filter black matrix resist composition and carbon black dispersion composition used for the composition SHOWA DENKO K.K. (JP) 2006-02-23 US disclosed
US-20050258406-A1 Black resist composition for color filter SHOWA DENKO K.K. 2005-11-24 US disclosed
EP-1576418-A1 COLOR FILTER BLACK MATRIX RESIST COMPOSITION AND CARBON BLACK DISPERSION COMPOSITION USED FOR THE COMPOSITION Showa Denko K.K. (JP) 2005-09-21 EP disclosed
US-20050153231-A1 Thiol compound, photopolymerization initiator composition and photosensitive composition SHOWA DENKO K.K. (JP) 2005-07-14 US disclosed
WO-2004055597-A1 COLOR FILTER BLACK MATRIX RESIST COMPOSITION AND CARBON BLACK DISPERSION COMPOSITION USED FOR THE COMPOSITION SHOWA DENKO K. K. (JP) 2004-07-01 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100233596-A1 THIOURETHANE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION RCOR3, CBR3, TAS2R3 L3MBTL1 3649/4885TDP1 1759/4885ALDH1A1 1341/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.